SCHEMBL3907831

SCHEMBL3907831

CCCC=CCCCC(CCC)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CHRM1 P11229 1/20 0.61
▸ AKR1A1 P14550 1/20 0.61
▸ CHRM3 P20309 1/20 0.61
▸ HTR2A P28223 1/20 0.61
▸ HTR2C P28335 1/20 0.61
▸ ADRA1A P35348 1/20 0.61
▸ HRH1 P35367 1/20 0.61
▸ DRD3 P35462 1/20 0.61
▸ SLC6A3 Q01959 1/20 0.61
▸ HDAC1 Q13547 1/20 0.61
▸ HDAC2 Q92769 1/20 0.61
▸ TDP1 Q9NUW8 1/20 0.61
▸ CA2 P00918 1/20 0.48
▸ MAPK1 P28482 1/20 0.48
▸ SLC1A2 P43004 3/20 0.44
▸ SLC1A1 P43005 3/20 0.44
▸ SLC1A3 P43003 2/20 0.44
▸ GRIK1 P39086 2/20 0.44
▸ GRIK2 Q13002 2/20 0.44
▸ TAS1R3 Q7RTX0 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3907830 1.00 CHRM1 (0.61) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL15636724 0.89 CA2 (0.64) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL15636725 0.89 CA2 (0.64) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL31538077 0.88 TDP1 (0.52) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL5048057 0.87 CHRM1 (0.59) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL5048061 0.87 CHRM1 (0.59) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL16543225 0.86 CA2 (0.55) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL7947011 0.86 CA2 (0.55) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL455900 0.85 TDP1 (0.57) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL1116084 0.85 CHRM1 (0.57) CHRM1AKR1A1CHRM3HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 — — US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 — — US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 — — US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 — — US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 — — EP disclosed
US-6677419-B1 REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-01-13 — — US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 — — US disclosed
Send feedback