Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CD | O00329 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | HMGCR | P04035 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19390249 | 0.80 | ALDH1A1 (0.35) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| SCHEMBL22965333 | 0.79 | HMGCR (0.55) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| SCHEMBL30794442 | 0.77 | PIK3CD (0.39) | PIK3CDALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL11161149 | 0.77 | PIK3CD (0.39) | PIK3CDALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL19036259 | 0.76 | ALDH1A1 (0.39) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| SCHEMBL12251197 | 0.76 | ALDH1A1 (0.39) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| SCHEMBL1782986 | 0.75 | ALDH1A1 (0.40) | ALDH1A1TDP1HMGCRCHRM1TBXA2R | |
| Isopropyl Alcohol SCHEMBL9245512 | 0.74 | PIK3CD (0.45) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| Isopropyl Alcohol SCHEMBL4854365 | 0.74 | PIK3CD (0.45) | PIK3CDALDH1A1TDP1HMGCRCHRM1 | |
| SCHEMBL9066481 | 0.73 | ALDH1A1 (0.39) | ALDH1A1TDP1HMGCRCHRM1TBXA2R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102841504-B | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI CORP | 2015-03-25 | — | — | CN | disclosed |
| US-20120328799-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME | CHI MEI CORPORATION (TW) | 2012-12-27 | — | — | US | disclosed |
| CN-102841504-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI CORP | 2012-12-26 | — | — | CN | disclosed |
| CN-1584631-B | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL IND LTD | 2011-09-21 | — | — | CN | disclosed |
| US-7517619-B2 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20050095530-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-05 | — | — | US | disclosed |
| EP-1508835-A2 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2005-02-23 | — | — | EP | disclosed |
| CN-1584631-A | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL IND LTD (JP) | 2005-02-23 | — | — | CN | disclosed |