Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL3909004

COC(=O)CC(C)(C)C.N

nearest known ligand 0.48

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
HSD17B10 Q99714 3/20 0.43
MGAM O43451 1/20 0.43
GAA P10253 1/20 0.43
SI P14410 1/20 0.43
MGAM2 Q2M2H8 1/20 0.43
TET2 Q6N021 1/20 0.41
RECQL P46063 2/20 0.39
KMT2A Q03164 3/20 0.36
MEN1 O00255 2/20 0.36
MIF P14174 1/20 0.35
NPC1 O15118 1/20 0.35
TP53 P04637 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
LMNA P02545 5/20 0.34
CA12 O43570 2/20 0.34
CA14 Q9ULX7 2/20 0.34
KDM4E B2RXH2 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167149 0.97
Hydrochloric Acid SCHEMBL27633679 0.94 TSHR (0.48) TSHRHSD17B10MGAMGAASI
Formaldehyde SCHEMBL3824097 0.92 TSHR (0.46) TSHRHSD17B10MGAMGAASI
Acrylic Acid SCHEMBL27996235 0.82 LMNA (0.42) TSHRHSD17B10MGAMGAASI
Ammonia Solution, Strong SCHEMBL28778682 0.81 TSHR (0.46) TSHRHSD17B10MGAMGAASI
SCHEMBL667630 0.80 TSHR (0.50) TSHRHSD17B10MGAMGAASI
SCHEMBL1014529 0.79 MGAM (0.46) TSHRHSD17B10MGAMGAASI
SCHEMBL1736947 0.79 TSHR (0.54) TSHRHSD17B10MGAMGAASI
SCHEMBL7047649 0.78 HMGCR (0.50) TSHRHSD17B10MGAMGAASI
SCHEMBL585604 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116239755-B Polyisocyanate composition with high reactivity and preparation method thereof 万华化学集团股份有限公司 2025-05-13 CN claimed
CN-119591835-A Dual-curing type polyisocyanate composition and preparation method and application thereof 万华化学集团股份有限公司 2025-03-11 CN claimed
CN-118290697-A Hydrogenated xylylene diisocyanate composition and preparation method thereof 万华化学集团股份有限公司 2024-07-05 CN claimed
CN-117209700-A Modified polyisocyanate composition, preparation method thereof and varnish 万华化学集团股份有限公司 2023-12-12 CN claimed
CN-108148394-A The stable mono-component polyurethane prepreg of storage from urethane composition and thus obtained formed body 赢创德固赛有限公司 2018-06-12 CN claimed
CN-102361902-A Prepreg and molded body produced therefrom at low temperature EVONIK DEGUSSA GMBH 2012-02-22 CN claimed
US-7572876-B2 Solid polyurethane powder coating compositions containing uretdione groups that are hardenable at low temperatures EVONIK DEGUSSA GMBH (DE) 2009-08-11 US claimed
US-20050003206-A1 Solid polyurethane powder coating compositions containing uretdione groups that are hardenable at low temperatures DEGUSSA AG (DE) 2005-01-06 US claimed
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US claimed
CN-116239755-B Polyisocyanate composition with high reactivity and preparation method thereof 万华化学集团股份有限公司 2025-05-13 CN disclosed
CN-119591835-A Dual-curing type polyisocyanate composition and preparation method and application thereof 万华化学集团股份有限公司 2025-03-11 CN disclosed
CN-112526822-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2025-02-28 CN disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-111856882-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-11-29 CN disclosed
CN-102933384-A Semifinished product for producing a fiber composite component based on a storage-stable polyurethane composition EVONIK DEGUSSA GMBH 2013-02-13 CN disclosed
CN-102361902-A Prepreg and molded body produced therefrom at low temperature EVONIK DEGUSSA GMBH 2012-02-22 CN disclosed
US-7572876-B2 Solid polyurethane powder coating compositions containing uretdione groups that are hardenable at low temperatures EVONIK DEGUSSA GMBH (DE) 2009-08-11 US disclosed
US-20050003206-A1 Solid polyurethane powder coating compositions containing uretdione groups that are hardenable at low temperatures DEGUSSA AG (DE) 2005-01-06 US disclosed
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US disclosed
US-4885115-A Liquid electrolyte for use in electrolytic capacitor NIPPON CHEMI-CON CORPORATION (JP) 1989-12-05 US disclosed