Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 5/20 | 0.52 |
| ▸ | SRC | P12931 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.42 |
| ▸ | GLS | O94925 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8852380 | 0.86 | PBRM1 (0.46) | CES1SRCALDH1A1CTNNB1LMNA | |
| SCHEMBL452703 | 0.85 | CES1 (0.49) | CES1SRCALDH1A1CES2CYP2C19 | |
| SCHEMBL11789186 | 0.83 | CES1 (0.50) | CES1SRCALDH1A1CES2CYP2C19 | |
| SCHEMBL4929013 | 0.82 | CES1 (0.46) | CES1SRCALDH1A1CES2LMNA | |
| SCHEMBL36374 | 0.82 | CES1 (0.48) | CES1SRCALDH1A1CES2CYP2C19 | |
| SCHEMBL5570579 | 0.81 | CYP2C19 (0.47) | ALDH1A1CYP2C19HIF1AGLSLMNA | |
| SCHEMBL7899580 | 0.81 | CYP2C19 (0.47) | ALDH1A1CYP2C19HIF1AGLSLMNA | |
| SCHEMBL584028 | 0.81 | CYP2C19 (0.47) | ALDH1A1CYP2C19HIF1AGLSLMNA | |
| SCHEMBL8036704 | 0.80 | SCN5A (0.49) | CES1SRCCES2 | |
| SCHEMBL12816020 | 0.80 | CES1 (0.52) | CES1SRCALDH1A1CES2CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2103 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-107077068-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-03-12 | — | — | CN | claimed |
| CN-106574022-B | Low cytotoxicity convertible adhesive compositions, medical dressings and skin coverings, and methods of treatment using same | 卢敏纳粘合剂公司 | 2020-08-14 | — | — | CN | claimed |
| CN-110357793-B | Oximation method of carboxylic ester | 中南大学 | 2020-07-31 | — | — | CN | claimed |
| US-10703942-B2 | Low cytotoxicity switchable adhesive compositions, medical dressings and skin coverings, and methods of treatment using same | LUMINA ADHESIVES AB (SE) | 2020-07-07 | — | — | US | claimed |
| EP-3114151-B1 | LOW CYTOTOXICITY SWITCHABLE ADHESIVE COMPOSITIONS, MEDICAL DRESSINGS AND SKIN COVERINGS, AND METHODS OF TREATMENT USING SAME | LUMINA ADHESIVES AB (SE) | 2020-04-29 | — | — | EP | claimed |
| CN-105511227-B | A kind of dry film photoresist and its layered product with good hole masking function | 杭州福斯特应用材料股份有限公司 | 2019-08-02 | — | — | CN | claimed |
| US-10005915-B2 | High-stretch energy curable inks and method of use in heat transfer label applications | SUN CHEMICAL CORPORATION (US) | 2018-06-26 | — | — | US | claimed |
| EP-3257677-A1 | INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS | Sun Chemical Corporation (US) | 2017-12-20 | — | — | EP | claimed |
| CN-106574022-A | Low cytotoxicity convertible adhesive compositions, medical dressings and skin coverings, and methods of treatment using same | 卢敏纳粘合剂公司 | 2017-04-19 | — | — | CN | claimed |
| US-6555595-B1 | Ethylenically-unsaturated monomer, a photoinitiator and poly-3,4-epoxy-1-butene | RENSSELAER POLYTECHNIC INSTITUTE | 2003-04-29 | — | — | US | claimed |
| EP-1302519-A1 | Photopolymerizable compositions | RENSSELAER POLYTECHNIC INSTITUTE (US) | 2003-04-16 | — | — | EP | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-5093467-A | Increased molecular weight | TOSOH CORPORATION (JP) | 1992-03-03 | — | — | US | claimed |
| EP-0348189-A2 | Production of poly (arylene sulfide sulfone) | Tosoh Corporation (JP) | 1989-12-27 | — | — | EP | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |