Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 5/20 | 0.48 |
| ▸ | SRC | P12931 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CES2 | O00748 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | DAO | P14920 | 1/20 | 0.41 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.41 |
| ▸ | GLS | O94925 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methoxymethane SCHEMBL36098 | 0.93 | CES1 (0.56) | CES1SRCMAPK1CYP3A4MAPT | |
| Trifluoromethylbenzene SCHEMBL28170271 | 0.91 | CES1 (0.50) | CES1ALDH1A1CES2TSHRPTPN1 | |
| SCHEMBL8768398 | 0.89 | CES1 (0.41) | CES1SRCMAPTKDM4EMEN1 | |
| SCHEMBL11057570 | 0.89 | CES1 (0.45) | CES1SRCMAPK1CYP3A4MAPT | |
| Ether SCHEMBL5403863 | 0.88 | CES1 (0.47) | CES1SRCMAPTMEN1KMT2A | |
| SCHEMBL27612829 | 0.87 | SMN1; SMN2 (0.50) | CES1SRCMAPTSMN1; SMN2ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL503620 | 0.87 | CES1 (0.46) | CES1SRCMAPK1CES2GLS | |
| SCHEMBL8329073 | 0.87 | CES1 (0.46) | CES1SRCMAPK1MAPTTDP1 | |
| SCHEMBL11789186 | 0.85 | CES1 (0.50) | CES1SRCMAPK1CYP3A4MAPT | |
| Acrylic Acid SCHEMBL6450313 | 0.84 | CES1 (0.47) | CES1SRCCYP3A4TDP1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 718 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119978604-A | Polymer film composition, polymer film, and laminate | 福斯特(滁州)新材料有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-118970163-A | Solid polymer electrolyte, lithium metal battery, and preparation methods and applications thereof | 北京大学 | 2024-11-15 | — | — | CN | claimed |
| US-20240208121-A1 | METHOD OF FILLING COOLING HOLES IN AN AIRFOIL COMPONENT | DYMAX | 2024-06-27 | — | — | US | claimed |
| CN-117638214-A | PET non-woven fabric-based polymer electrolyte for lithium ion battery, and preparation method and application thereof | 北京大学 | 2024-03-01 | — | — | CN | claimed |
| EP-2582745-B1 | COATING FORMULATION FOR PREPARING A HYDROPHILIC COATING | DSM IP ASSETS BV (NL) | 2019-01-09 | — | — | EP | claimed |
| US-9737637-B2 | Method for reducing the amount of migrateables of polymer coatings | DSM IP ASSETS B.V. (NL) | 2017-08-22 | — | — | US | claimed |
| US-20170002100-A1 | DEPOLYMERISATION OF POLYSACCHARIDES AND RELATED PRODUCTS | LAMBERTI SPA (IT) | 2017-01-05 | — | — | US | claimed |
| EP-2252661-B1 | HYDROPHILIC COATING | DSM IP ASSETS BV (NL) | 2016-10-05 | — | — | EP | claimed |
| US-20150352259-A1 | HYDROPHILIC COATING | DSM IP ASSETS B.V. (NL) | 2015-12-10 | — | — | US | claimed |
| US-20150291707-A1 | DEPOLYMERISATION OF POLYSACCHARIDES AND RELATED PRODUCTS | LAMBERTI SPA (IT) | 2015-10-15 | — | — | US | claimed |
| EP-0196324-A4 | POST-TREATMENT OF CURED, RADIATION SENSITIVE POLYMERIZABLE RESINS. | MACDERMID INC (US) | 1988-01-21 | — | — | EP | claimed |
| EP-0085024-B1 | METHOD FOR PRODUCING IMAGES IN PHOTORESIST LAYERS | CIBA-GEIGY AG (CH) | 1987-07-15 | — | — | EP | claimed |
| US-4618564-A | Process for production of positive images using sulfonic acid precursors | CIBA-GEIGY CORPORATION (US) | 1986-10-21 | — | — | US | claimed |
| EP-0196324-A1 | POST-TREATMENT OF CURED, RADIATION SENSITIVE POLYMERIZABLE RESINS | MACDERMID, INCORPORATED (US) | 1986-10-08 | — | — | EP | claimed |
| US-4603058-A | IMMERSION IN ETHYLENICALLY UNSATURATED MONOMER, EXPOSURE TO ACTINIC RADIATION | MACDERMID, INCORPORATED (US) | 1986-07-29 | — | — | US | claimed |
| WO-1986002177-A1 | POST-TREATMENT OF CURED, RADIATION SENSITIVE POLYMERIZABLE RESINS | MACDERMID, INCORPORATED (US) | 1986-04-10 | — | — | WO | claimed |
| US-4439517-A | Process for the formation of images with epoxide resin | CIBA-GEIGY CORPORATION (US) | 1984-03-27 | — | — | US | claimed |
| EP-0085024-A2 | Method for producing images in photoresist layers | CIBA-GEIGY AG (CH) | 1983-08-03 | — | — | EP | claimed |
| US-4351708-A | A COCATALYST MIXTURE OF AN AROMATIC IODONIUM SALT, AN AROMATIC CARBONYL PHOTOINITIATOR AND A FREE RADICAL CATALYST | CIBA-GEIGY CORPORATION (US) | 1982-09-28 | — | — | US | claimed |
| US-4266005-A | Photosensitive elastomeric composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1981-05-05 | — | — | US | claimed |