Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL27780128 | 0.70 | LMNA (0.48) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL7995856 | 0.68 | LMNA (0.59) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL2592696 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL2953527 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL30697536 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL38985 | 0.67 | — | — | |
| Acrylic Acid SCHEMBL2953833 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL2952517 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL2952171 | 0.67 | LMNA (0.67) | LMNAALDH1A1 | |
| Acrylic Acid SCHEMBL7111601 | 0.67 | LMNA (0.67) | LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11492432-B2 | Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2022-11-08 | — | — | US | disclosed |
| US-7566156-B2 | Method of manufacturing backlight unit, backlight unit, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2009-07-28 | — | — | US | disclosed |
| US-7375893-B2 | Method of manufacturing microlens, microlens, optical film, screen for projection, projector system, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060291239-A1 | METHOD OF MANUFACTURING BACKLIGHT UNIT, BACKLIGHT UNIT, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060262410-A1 | METHOD OF MANUFACTURING MICROLENS, MICROLENS, OPTICAL FILM, SCREEN FOR PROJECTION, PROJECTOR SYSTEM, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |