Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 13/20 | 0.35 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.33 |
| ▸ | GMNN | O75496 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL322644 | 0.89 | EPHX2 (0.38) | PRKCA | |
| SCHEMBL16666208 | 0.89 | EPHX2 (0.38) | PRKCA | |
| SCHEMBL29540037 | 0.83 | EPHX2 (0.39) | PRKCATRPV1 | |
| SCHEMBL9414401 | 0.83 | EPHX2 (0.39) | PRKCATRPV1 | |
| SCHEMBL9848775 | 0.83 | EPHX2 (0.39) | PRKCATRPV1 | |
| SCHEMBL9414404 | 0.83 | EPHX2 (0.39) | PRKCATRPV1 | |
| SCHEMBL11210120 | 0.82 | PRKCA (0.36) | PRKCATRPV1 | |
| SCHEMBL7744012 | 0.81 | PRKCA (0.33) | PRKCA | |
| SCHEMBL7744010 | 0.81 | PRKCA (0.33) | PRKCA | |
| SCHEMBL6682873 | 0.80 | PRKCA (0.35) | PRKCALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0896042-B1 | A polishing composition including an inhibitor of tungsten etching | CABOT MICROELECTRONICS CORP (US) | 2005-02-09 | — | — | EP | claimed |
| US-6136711-A | CHEMICAL MECHANICAL POLISHING MIXTURE COMPRISING A STABILIZER TO MINIMIZE ETCHING AND CORROSION | CABOT CORPORATION (US) | 2000-10-24 | — | — | US | claimed |
| EP-0896042-A1 | A polishing composition including an inhibitor of tungsten etching | Cabot Corporation (US) | 1999-02-10 | — | — | EP | claimed |
| WO-1999005706-A1 | A POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING | CABOT CORPORATION (US) | 1999-02-04 | — | — | WO | claimed |
| EP-2038361-A1 | TUNABLE SELECTIVITY SLURRIES IN CMP APPLICATIONS | Cabot Microelectronics Corporation (US) | 2009-03-25 | — | — | EP | disclosed |
| US-20090008600-A1 | METHOD AND COMPOSITION FOR POLISHING A SUBSTRATE | APPLIED MATERIALS, INC. | 2009-01-08 | — | — | US | disclosed |
| US-7390744-B2 | Method and composition for polishing a substrate | APPLIED MATERIALS, INC. (US) | 2008-06-24 | — | — | US | disclosed |
| US-20080035882-A1 | COMPOSITION FOR POLISHING A SUBSTRATE | APPLIED MATERIALS, INC. | 2008-02-14 | — | — | US | disclosed |
| WO-2008005160-A1 | TUNABLE SELECTIVITY SLURRIES IN CMP APPLICATIONS | CABOT MICROELECTRONICS CORPORATION (US) | 2008-01-10 | — | — | WO | disclosed |
| US-7294576-B1 | Tunable selectivity slurries in CMP applications | CABOT MICROELECTRONICS CORPORATION (US) | 2007-11-13 | — | — | US | disclosed |
| US-20060196778-A1 | Tungsten electroprocessing | APPLIED MATERIALS, INC. | 2006-09-07 | — | — | US | disclosed |
| WO-2006086265-A2 | METHOD AND COMPOSITION FOR POLISHING A SUBSTRATE | APPLIED MATERIALS, INC. (US) | 2006-08-17 | — | — | WO | disclosed |
| US-6083419-A | FOR SEMICONDUCTORS | CABOT CORPORATION (US) | 2000-07-04 | — | — | US | disclosed |
| EP-0896042-A1 | A polishing composition including an inhibitor of tungsten etching | Cabot Corporation (US) | 1999-02-10 | — | — | EP | disclosed |
| WO-1999005706-A1 | A POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING | CABOT CORPORATION (US) | 1999-02-04 | — | — | WO | disclosed |
| EP-0170939-B1 | ELECTROVISCOUS FLUIDS | BAYER AG (DE) | 1988-07-20 | — | — | EP | disclosed |
| US-4668417-A | Electroviscous fluids | BAYER AKTIENGESELLSCHAFT (DE) | 1987-05-26 | — | — | US | disclosed |
| US-4645614-A | SILICA-GEL, SILICONE OIL, AND POLYSILOXANES | BAYER AKTIENGESELLSCHAFT (DE) | 1987-02-24 | — | — | US | disclosed |
| EP-0201827-A2 | Electroviscous fluids | BAYER AG (DE) | 1986-11-20 | — | — | EP | disclosed |
| EP-0170939-A1 | Electroviscous fluids | BAYER AG (DE) | 1986-02-12 | — | — | EP | disclosed |