Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 9/20 | 0.39 |
| ▸ | PPARD | Q03181 | 8/20 | 0.39 |
| ▸ | PPARA | Q07869 | 8/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.39 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.39 |
| ▸ | TSHR | P16473 | 4/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TLR2 | O60603 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | FABP4 | P15090 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.39 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | PDE4A | P27815 | 1/20 | 0.39 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL994337 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL995804 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL992967 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL993590 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL9737418 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL995960 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL995729 | 1.00 | PPARG (0.39) | PPARGPPARDPPARAGPR84HDAC11 | |
| Ammonia Solution, Strong SCHEMBL7896973 | 0.99 | PPARG (0.38) | PPARGPPARDPPARAGPR84HDAC11 | |
| Hydrochloric Acid SCHEMBL4045761 | 0.99 | PPARG (0.38) | PPARGPPARDPPARAGPR84HDAC11 | |
| SCHEMBL993909 | 0.97 | PPARG (0.36) | PPARGPPARDPPARAGPR84HDAC11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4067 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146144-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2026-05-28 | — | — | US | claimed |
| US-12600818-B2 | Process for the preparation of sterically hindered nitroxyl ethers | GENEUSCHEM AG (CH) | 2026-04-14 | — | — | US | claimed |
| EP-3786216-B1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECH CORP (US) | 2026-02-11 | — | — | EP | claimed |
| US-20250223403-A1 | PROCESS FOR THE PREPARATION OF STERICALLY HINDERED NITROXYL ETHERS | GENEUSCHEM AG (CH) | 2025-07-10 | — | — | US | claimed |
| EP-3841166-B2 | STABILIZED ROTOMOLDED POLYOLEFIN | BASF SE (DE) | 2025-05-07 | — | — | EP | claimed |
| WO-2025067782-A1 | PREPARATION OF N-ALKOXYAMINE HALS FROM CORRESPONDING HYDROXYLAMINES | GENEUSCHEM AG (CH) | 2025-04-03 | — | — | WO | claimed |
| EP-4504702-A1 | PROCESS FOR THE PREPARATION OF STERICALLY HINDERED NITROXYL ETHERS | Zedda Innovation Consulting (CH) | 2025-02-12 | — | — | EP | claimed |
| EP-4251696-B1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | claimed |
| EP-3137540-B1 | STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC IND INC (US) | 2024-10-30 | — | — | EP | claimed |
| US-20240317968-A1 | HIGH CLARITY AND LOW HAZE UV STABILIZED STYRENE AND METHYL METHACRYLATE COPOLYMERS | INEOS STYROLUTION GROUP GMBH (DE) | 2024-09-26 | — | — | US | claimed |
| US-5699182-A | NAPHTHOPYRAN PHOTOCHROME AND HINDERED AMINOETHER LIGHT STABILIZER | XYTRONYX, INC. (US) | 1997-12-16 | — | — | US | claimed |
| EP-0434608-B1 | Stabilized organic material | CIBA GEIGY AG (CH) | 1997-04-02 | — | — | EP | claimed |
| WO-1996037576-A9 | LIGHT FATIGUE RESISTANT PHOTOCHROMIC FORMULATIONS | — | 1997-01-23 | — | — | WO | claimed |
| WO-1996037576-A1 | LIGHT FATIGUE RESISTANT PHOTOCHROMIC FORMULATIONS | XYTRONYX, INC. (US) | 1996-11-28 | — | — | WO | claimed |
| EP-0675160-A2 | Ultraviolet light stabilized polyamide compositions | GENERAL ELECTRIC COMPANY (US) | 1995-10-04 | — | — | EP | claimed |
| EP-0675159-A1 | Ultraviolet light stabilized polymer compositions | GENERAL ELECTRIC COMPANY (US) | 1995-10-04 | — | — | EP | claimed |
| EP-0467850-B1 | Stabilized monomer compositions | CIBA GEIGY AG (CH) | 1995-09-06 | — | — | EP | claimed |
| EP-0309402-B1 | N-substituted hindered amine stabilizers | CIBA GEIGY AG (CH) | 1995-01-11 | — | — | EP | claimed |
| US-5124378-A | Resin containign N-Hydroxyl hindered amine oxidative and light stabilizers | CIBA-GEIGY CORPORATION (US) | 1992-06-23 | — | — | US | claimed |
| US-5004770-A | Light, heat, and oxygen resistant | CIBA-GEIGY CORPORATION (US) | 1991-04-02 | — | — | US | claimed |