⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30726857 | 0.73 | KCNH2 (0.34) | — | |
| SCHEMBL3757679 | 0.73 | — | — | |
| SCHEMBL209150 | 0.69 | EPHX1 (0.35) | — | |
| SCHEMBL2106124 | 0.69 | KCNH2 (0.39) | — | |
| Hydrogen Peroxide SCHEMBL28133733 | 0.67 | CES2 (0.30) | — | |
| SCHEMBL28037497 | 0.67 | CES2 (0.30) | — | |
| SCHEMBL28347583 | 0.65 | KCNH2 (0.33) | — | |
| SCHEMBL4399482 | 0.64 | — | — | |
| SCHEMBL420639 | 0.64 | — | — | |
| SCHEMBL14027929 | 0.64 | EPHX1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8431516-B2 | Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid | LASERWORT LTD (HK) | 2013-04-30 | — | — | US | claimed |
| US-20120129345-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | LASERWORT LTD (HK) | 2012-05-24 | — | — | US | claimed |
| US-8148311-B2 | Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid | LASERWORT LTD (HK) | 2012-04-03 | — | — | US | claimed |
| US-8148310-B2 | Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid | LASERWORT LTD (HK) | 2012-04-03 | — | — | US | claimed |
| US-20110247650-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | LASERWORT LTD (HK) | 2011-10-13 | — | — | US | claimed |
| US-20110098205-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | Lee, Wai Mun (US) | 2011-04-28 | — | — | US | claimed |
| EP-3027695-B1 | AQUEOUS CLEANING COMPOSITIONS INCLUDING AN ALKYL 3-HYDROXYBUTYRATE | EASTMAN CHEM CO (US) | 2019-05-08 | — | — | EP | disclosed |
| US-9506017-B2 | Aqueous cleaning compositions including an alkyl 3-hydroxybutyrate | EASTMAN CHEMICAL COMPANY (US) | 2016-11-29 | — | — | US | disclosed |
| EP-3027695-A1 | AQUEOUS CLEANING COMPOSITIONS INCLUDING AN ALKYL 3-HYDROXYBUTYRATE | Eastman Chemical Company (US) | 2016-06-08 | — | — | EP | disclosed |
| US-9255241-B2 | Aqueous cleaning compositions including an alkyl 3-hydroxybutyrate | EASTMAN CHEMICAL COMPANY (US) | 2016-02-09 | — | — | US | disclosed |
| US-9249378-B2 | Aqueous cleaning compositions having enhanced properties | EASTMAN CHEMICAL COMPANY (US) | 2016-02-02 | — | — | US | disclosed |
| US-9163202-B2 | Aqueous cleaning compositions including an alkyl 3-hydroxybutyrate | EASTMAN CHEMICAL COMPANY (US) | 2015-10-20 | — | — | US | disclosed |
| US-20150225676-A1 | AQUEOUS CLEANING COMPOSITIONS INCLUDING AN ALKYL 3-HYDROXYBUTYRATE | EASTMAN CHEMICAL COMPANY | 2015-08-13 | — | — | US | disclosed |
| US-8148311-B2 | Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid | LASERWORT LTD (HK) | 2012-04-03 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110247650-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | LASERWORT LTD (HK) | 2011-10-13 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20110098205-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | Lee, Wai Mun (US) | 2011-04-28 | — | — | US | disclosed |
| US-20110098205-A1 | COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES | Lee, Wai Mun (US) | 2011-04-28 | — | — | US | disclosed |
| US-5930950-A | Method of inhibiting the formation of crystalline mineral deposits in soil | CH20 INCORPORATED (US) | 1999-08-03 | — | — | US | disclosed |