Di(Hydroxyethyl)Ether

Di(Hydroxyethyl)Ether

SCHEMBL392786

COOOC.OCCOCCO

nearest known ligand 0.62

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Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.62
MAPK1 P28482 1/20 0.62
MEN1 O00255 2/20 0.59
KMT2A Q03164 2/20 0.59
ALDH1A1 P00352 1/20 0.50
THRB P10828 1/20 0.44
HTT P42858 1/20 0.44
MAPT P10636 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraethylene Glycol SCHEMBL9747717 0.97 MEN1 (0.65) TSHRMAPK1MEN1KMT2AALDH1A1
Triethylene Glycol SCHEMBL2830692 0.97 MEN1 (0.65) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL9058372 0.83 TSHR (0.77) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL6171 0.83 TSHR (0.77) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL5692208 0.80 TSHR (0.71) TSHRMAPK1MEN1KMT2AALDH1A1
Triethylene Glycol SCHEMBL16125 0.80 MEN1 (0.79) TSHRMAPK1MEN1KMT2AALDH1A1
Tetraethylene Glycol SCHEMBL14919 0.80 MEN1 (0.79) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL4459339 0.79
Ethylene Glycol SCHEMBL5225335 0.79
Di(Hydroxyethyl)Ether SCHEMBL6856328 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108348871-B Highly branched, non-crosslinked aerogels, method for the production thereof and use thereof 蓝移材料有限公司 2021-11-05 CN claimed
CN-105392822-B Aeroge synthetic method 耐克索尔夫公司 2018-08-14 CN claimed
CN-106602181-A Chlorine-magnesium battery and energy storage method thereof 西华大学 2017-04-26 CN claimed
CN-119365523-A Articles comprising a combination of polymer aerogel and melamine formaldehyde foam and related systems and methods 气凝胶科技有限责任公司 2025-01-24 CN disclosed
CN-118952792-A Internally reinforced aerogel and use thereof 蓝移材料有限公司 2024-11-15 CN disclosed
CN-118922514-A Flame retardant and heat insulating material 蓝移材料有限公司 2024-11-08 CN disclosed
US-20240174815-A1 ORGANOPOLYSILOXANE COMPOSITION DOW TORAY CO LTD (JP) 2024-05-30 US disclosed
CN-117999165-A Heat-resistant laminate 蓝移材料有限公司 2024-05-07 CN disclosed
EP-4317282-A1 ORGANOPOLYSILOXANE COMPOSITION Dow Toray Co., Ltd. (JP) 2024-02-07 EP disclosed
CN-117362741-A Heat treated polyamide-amide aerogel 蓝移材料有限公司 2024-01-09 CN disclosed
CN-117043275-A Organopolysiloxane composition 陶氏东丽株式会社 2023-11-10 CN disclosed
US-20110059263-A1 RETARDATION SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY TOPPAN PRINTING CO., LTD. (JP) 2011-03-10 US disclosed
US-20110025953-A1 Retardation plate, method for manufacturing the retardation plate, and liquid crystal display TOPPAN PRINTING CO., LTD. (JP) 2011-02-03 US disclosed
US-7872715-B2 Liquid crystal display device and method for manufacturing the same TOPPAN PRINTING CO., LTD. (JP) 2011-01-18 US disclosed
EP-2261703-A1 RETARDATION PLATE, METHOD FOR MANUFACTURING THE RETARDATION PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE Toppan Printing Co., Ltd. (JP) 2010-12-15 EP disclosed
US-20100149460-A1 Liquid Crystal Display Device and Method for Manufacturing the Same TOPPAN PRINTING CO., LTD. (JP) 2010-06-17 US disclosed
US-20100060845-A1 RETARDATION SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY TOPPAN PRINTING CO., LTD. (JP) 2010-03-11 US disclosed
EP-2120072-A1 RETARDATION SUBSTRATE, METHOD FOR PRODUCTION THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE Toppan Printing Co., Ltd. (JP) 2009-11-18 EP disclosed
US-20090279042-A1 RETARDATION SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY TOPPAN PRINTING CO., LTD. (JP) 2009-11-12 US disclosed
US-20090128743-A1 Retardation substrate, method of manufacturing the same, and liquid crystal display TOPPAN PRINTING CO., LTD (JP) 2009-05-21 US disclosed