SCHEMBL3929314

SCHEMBL3929314

FC(F)(F)C(F)(C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10605500 1.00
SCHEMBL3919976 1.00
SCHEMBL3921364 1.00
SCHEMBL2065358 0.86
SCHEMBL9449659 0.83
SCHEMBL724422 0.82
SCHEMBL1096254 0.82
SCHEMBL14715258 0.82
SCHEMBL20591918 0.82
SCHEMBL760447 0.82 LMNA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114561072-B Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2023-07-25 CN claimed
CN-114561072-A Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2022-05-31 CN claimed
CN-114561072-B Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2023-07-25 CN disclosed
CN-114561072-A Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2022-05-31 CN disclosed
US-20160313303-A1 BICOMPATIBLE LIQUID AND METHOD FOR SCREENING SAME KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2016-10-27 US disclosed
EP-1947717-B1 ELECTRODE CATALYST LAYER JSR CORP (JP) 2013-02-13 EP disclosed
US-8236206-B2 Electrode catalyst layer JSR CORPORATION (JP) 2012-08-07 US disclosed
US-20090134360-A1 ELECTRODE CATALYST LAYER JSR CORPORATION (JP) 2009-05-28 US disclosed
CN-100432140-C Liquid curable resin composition, cured film, and laminate JSR CORP (JP) 2008-11-12 CN disclosed
US-7419707-B2 Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device FUJIFILM CORPORATION (JP) 2008-09-02 US disclosed
EP-1947717-A1 ELECTRODE CATALYST LAYER JSR Corporation (JP) 2008-07-23 EP disclosed
EP-1624022-A1 LIQUID RESIN COMPOSITION, CURED FILM AND LAMINATE JSR Corporation (JP) 2006-02-08 EP disclosed
CN-1646584-A Fluorinated olefin polymer, curable resin composition, and antireflection film JSR CORP (JP) 2005-07-27 CN disclosed
US-6832949-B2 Window member for chemical mechanical polishing and polishing pad JSR CORPORATION (JP) 2004-12-21 US disclosed
US-20030129931-A1 Window member for chemical mechanical polishing and polishing pad JSR CORPORATION (JP) 2003-07-10 US disclosed
EP-1306163-A1 Window member for chemical mechanical polishing and polishing pad JSR Corporation (JP) 2003-05-02 EP disclosed
EP-0953584-B1 Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating JSR CORP (JP) 2002-12-18 EP disclosed
US-6271326-B1 ETHYLENE-TETRAFLUOROETHYLENE-STYRENE POLYMERS AND VINYL ACETATE OR ACRYLIC ACID POLYMERS JSR CORPORATION (JP) 2001-08-07 US disclosed
US-6051665-A A FLUOROPOLYMER IS OBTAINED FROM THE MONOMER SELECTED FROM THE GROUP CONTAINING A FLUORO-OLEFIN, A FLUORO VINYL ETHER, A FLUORO (METH) ACRYLATE AND MIXTURE, ALSO CONTAIN HYDROLYZABLE SILYL GROUP, A SILOXY COMPOUND AND A CHELATE COMPLEX JSR CORPORATION (JP) 2000-04-18 US disclosed
EP-0953584-A1 Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating JSR Corporation (JP) 1999-11-03 EP disclosed