⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL396933 | 0.81 | — | — | |
| SCHEMBL35611 | 0.79 | — | — | |
| SCHEMBL396291 | 0.78 | — | — | |
| SCHEMBL396762 | 0.78 | — | — | |
| SCHEMBL9819983 | 0.76 | — | — | |
| SCHEMBL536964 | 0.74 | — | — | |
| SCHEMBL537350 | 0.73 | — | — | |
| SCHEMBL8965827 | 0.72 | HSD17B10 (0.30) | — | |
| SCHEMBL537009 | 0.72 | — | — | |
| SCHEMBL17374781 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12600820-B2 | Photocurable composition with high silicon content | CANON KABUSHIKI KAISHA (JP) | 2026-04-14 | — | — | US | claimed |
| US-20250368802-A1 | PHOTOCURABLE COMPOSITION WITH HIGH SILICON CONTENT AND HIGH STABILITY | CANON KK (JP) | 2025-12-04 | — | — | US | claimed |
| US-20240199816-A1 | PHOTOCURABLE COMPOSITION WITH HIGH SILICON CONTENT | CANON KABUSHIKI KAISHA (JP) | 2024-06-20 | — | — | US | claimed |
| WO-2024123531-A1 | PHOTOCURABLE COMPOSITION WITH HIGH SILICON CONTENT | CANON KABUSHIKI KAISHA (JP) | 2024-06-13 | — | — | WO | claimed |
| EP-1898264-B1 | Toner compositions | XEROX CORP (US) | 2016-04-06 | — | — | EP | claimed |
| US-8969429-B2 | Low-tack, hydrophobic ophthalmic device materials | NOVARTIS AG (CH) | 2015-03-03 | — | — | US | claimed |
| EP-2673666-B1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | NOVARTIS AG (CH) | 2014-12-31 | — | — | EP | claimed |
| EP-2673666-A1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | Novartis AG (CH) | 2013-12-18 | — | — | EP | claimed |
| WO-2012109228-A1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | NOVARTIS AG (CH) | 2012-08-16 | — | — | WO | claimed |
| US-20120202916-A1 | Low-Tack, Hydrophobic Ophthalmic Device Materials | NOVARTIS AG (CH) | 2012-08-09 | — | — | US | claimed |
| US-8142970-B2 | Toner compositions | XEROX CORPORATION (US) | 2012-03-27 | — | — | US | claimed |
| US-7816464-B2 | Polymer particle dispersion, cosmetic composition comprising it and cosmetic process using it | L'OREAL, S.A. (FR) | 2010-10-19 | — | — | US | claimed |
| EP-4749682-A1 | CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20260140445-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-21 | — | — | US | disclosed |
| US-20260126725-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-07 | — | — | US | disclosed |
| EP-4738008-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |
| WO-2000069978-A1 | CHROMIUM-FREE CORROSION PREVENTIVE AND CORROSION PREVENTION METHOD | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2000-11-23 | — | — | WO | disclosed |
| US-6011119-A | RESIN COMPOSITION SHOWS EXCELLENT CHARGING CHARACTERISTICS WITHOUT A CHARGE CONTROL AGENT; HIGH AND LOW MOLECULAR WEIGHT ADDITION POLYMERS AT LEAST ONE OF WHICH IS FROM AN UNSATURATED ANHYDRIDE AND AN ACRYLOYLOXYALKYL DICARBOXYLIC ACID ESTER | MITSUI CHEMICALS, INC. (JP) | 2000-01-04 | — | — | US | disclosed |
| EP-0756208-A1 | Resin composition for electrophotographic toner, and toner comprising it | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-01-29 | — | — | EP | disclosed |