Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | PDCD1 | Q15116 | 2/20 | 0.35 |
| ▸ | CD274 | Q9NZQ7 | 2/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31302207 | 1.00 | TYR (0.40) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL428824 | 0.82 | KDM4E (0.39) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL3468895 | 0.81 | TYR (0.42) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL29624183 | 0.79 | PDCD1 (0.36) | KDM4EALDH1A1HPGDHSD17B10SMN1; SMN2 | |
| SCHEMBL205613 | 0.79 | PDCD1 (0.36) | KDM4EALDH1A1HPGDHSD17B10SMN1; SMN2 | |
| SCHEMBL28845277 | 0.79 | TYR (0.55) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL207165 | 0.78 | KDM4E (0.41) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL31394482 | 0.76 | PDCD1 (0.34) | KDM4EALDH1A1HPGDHSD17B10PDCD1 | |
| SCHEMBL31098402 | 0.76 | KDM4E (0.36) | TYRKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL286284 | 0.76 | KDM4E (0.36) | TYRKDM4EALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 288 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0273026-A2 | Solvents for Photoresist compositions | SHIPLEY COMPANY INC. (US) | 1988-06-29 | — | — | EP | claimed |
| JP-9136850-A | — | — | None | — | — | JP | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-12422750-B2 | Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| US-20250264801-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-4596608-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| EP-4597225-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250236697-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-07-24 | — | — | US | disclosed |
| EP-4398289-B1 | CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND PROCESSING LIQUID | FUJIFILM CORP (JP) | 2025-07-02 | — | — | EP | disclosed |
| WO-2025094716-A1 | RESIN COMPOSITION | 富士フイルム株式会社 | 2025-05-08 | — | — | WO | disclosed |
| US-5128230-A | Positive working photoresist | SHIPLEY COMPANY INC. (US) | 1992-07-07 | — | — | US | disclosed |
| US-5051454-A | An esterified phenolic compound, an unesterified phenolic resole and a base and curing | BORDEN, INC. (US) | 1991-09-24 | — | — | US | disclosed |
| US-4983492-A | Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol | SHIPLEY COMPANY INC. (US) | 1991-01-08 | — | — | US | disclosed |
| EP-0377996-A1 | Phenolic resins | BORDEN (UK) LIMITED (GB) | 1990-07-18 | — | — | EP | disclosed |
| EP-0377308-A1 | Phenolic resins | BORDEN (UK) LIMITED (GB) | 1990-07-11 | — | — | EP | disclosed |
| WO-1990006903-A1 | PHENOLIC RESINS | BORDEN (UK) LIMITED (GB) | 1990-06-28 | — | — | WO | disclosed |
| WO-1990006904-A2 | PHENOLIC RESINS | BORDEN (UK) LIMITED (GB) | 1990-06-28 | — | — | WO | disclosed |
| EP-0345714-A2 | Dyed photoresist compositions and process | ASPECT SYSTEMS CORPORATION (US) | 1989-12-13 | — | — | EP | disclosed |
| EP-0273026-A2 | Solvents for Photoresist compositions | SHIPLEY COMPANY INC. (US) | 1988-06-29 | — | — | EP | disclosed |
| US-4469516-A | Pigment preparations; process for their manufacture and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-09-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | TYR 4050/4885KDM4E 295/4885ALDH1A1 3316/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.