Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4576031 | 0.95 | — | — | |
| SCHEMBL4577114 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL6912160 | 0.74 | — | — | |
| SCHEMBL4577491 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL7951615 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL7197770 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL2565045 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL393956 | 0.69 | — | — | |
| SCHEMBL5852485 | 0.69 | — | — | |
| SCHEMBL2870650 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118852495-A | Supported catalyst and preparation and application thereof | 上海化工研究院有限公司 | 2024-10-29 | — | — | CN | claimed |
| EP-4237373-A1 | MODIFIED CARBON-BASED MATERIALS | Yissum Research Development Company of the Hebrew University of Jerusalem Ltd. (IL) | 2023-09-06 | — | — | EP | claimed |
| CN-116535548-A | Catalyst composition and preparation method and application thereof | 上海立得催化剂有限公司 | 2023-08-04 | — | — | CN | claimed |
| WO-2022091105-A1 | MODIFIED CARBON-BASED MATERIALS | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) | 2022-05-05 | — | — | WO | claimed |
| CN-112645971-B | Method for directly preparing alkyl borate compound from alkyl halide | 中国科学院兰州化学物理研究所 | 2021-12-24 | — | — | CN | claimed |
| CN-112645971-A | Method for directly preparing alkyl borate compound from alkyl halide | 中国科学院兰州化学物理研究所 | 2021-04-13 | — | — | CN | claimed |
| EP-2834309-A2 | HYBRID METAL AND METAL OXIDE LAYERS WITH ENHANCED ACTIVITY | Yissum Research and Development Company of The Hebrew University of Jerusalem (IL) | 2015-02-11 | — | — | EP | claimed |
| WO-2013150533-A2 | HYBRID METAL AND METAL OXIDE LAYERS WITH ENHANCED ACTIVITY | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD. (IL) | 2013-10-10 | — | — | WO | claimed |
| US-8395146-B2 | Composition and organic insulating film prepared using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-03-12 | — | — | US | claimed |
| US-8153267-B2 | Composition and organic insulator prepared using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-04-10 | — | — | US | claimed |
| US-20070129473-A1 | Organic insulator composition, organic insulating film having the same, organic thin film transistor having the same and electronic device having the same and methods of forming the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-20060147715-A1 | Composition for preparing organic insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-07-06 | — | — | US | claimed |
| US-7005674-B2 | Organic thin film transistor comprising multi-layered gate insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-28 | — | — | US | claimed |
| US-20060041096-A1 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-23 | — | — | US | claimed |
| US-20050259212-A1 | Composition for preparing organic insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-24 | — | — | US | claimed |
| EP-1524299-A1 | Composition for preparing organic insulator | Samsung Electronics Co., Ltd (KR) | 2005-04-20 | — | — | EP | claimed |
| US-20050001210-A1 | Organic thin film transistor comprising multi-layered gate insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-01-06 | — | — | US | claimed |
| EP-1494298-A2 | Organic thin film transistor comprising multi-layered gate insulator | Samsung Electronics Co., Ltd. (KR) | 2005-01-05 | — | — | EP | claimed |
| US-6436605-B1 | Plasma resistant composition and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-08-20 | — | — | US | claimed |
| EP-1153905-A1 | NOVEL CRYSTALLINE ION-ASSOCIATION SUBSTANCE, PROCESS FOR PRODUCING THE SAME, AND POLYMERIZATION INITIATOR | AUTEX, INC. (JP) | 2001-11-14 | — | — | EP | claimed |