SCHEMBL395499

SCHEMBL395499

C=C(Cl)C(=O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,2-Dichloroethane SCHEMBL11680174 0.89 ALDH1A1 (0.46)
SCHEMBL8855320 0.89 ALDH1A1 (0.75)
Methacrylic Acid SCHEMBL11649847 0.87 ALDH1A1 (0.56)
SCHEMBL11408783 0.83 TDP1 (0.48)
SCHEMBL5025760 0.82
SCHEMBL11513738 0.78 GSK3A (0.42)
SCHEMBL26112685 0.78 ALDH1A1 (0.40)
SCHEMBL5610835 0.77
1,1-Dichloroethene SCHEMBL2295845 0.77 ALDH1A1 (0.83)
SCHEMBL7640505 0.76 ALDH1A1 (0.71)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3609 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4045544-B1 SUPER ADVANCED CONTROLLED RADICAL POLYMERIZATION BASF COATINGS GMBH (DE) 2026-03-18 EP claimed
US-12534561-B2 Controlled radical polymerization BASF COATINGS GMBH (DE) 2026-01-27 US claimed
EP-4001367-B1 AQUEOUS INKJET INK COMPOSITIONS MADE FROM HIGH VISCOSITY LATEXES XEROX CORP (US) 2026-01-07 EP claimed
EP-4561326-A2 METHOD OF SELECTIVELY ETCHING A METAL COMPONENT Microsoft Technology Licensing LLC (US) 2025-05-28 EP claimed
EP-4070390-B1 METHOD OF SELECTIVELY ETCHING A METAL COMPONENT MICROSOFT TECHNOLOGY LICENSING LLC (US) 2025-05-21 EP claimed
WO-2025097044-A1 AEROGEL IMPLANTS FOR CONTRACEPTION Contraline, Inc. (US) 2025-05-08 WO claimed
EP-3847220-B1 UV-CURABLE HOT MELT ADHESIVE COMPOSITIONS FOR FLOORING APPLICATIONS BASF SE (DE) 2025-03-05 EP claimed
CN-119230929-A Gel battery cell and preparation method and application thereof 中国第一汽车股份有限公司 2024-12-31 CN claimed
CN-119200332-A Layered structure for electron beam lithography process and lithography process thereof 国科天骥(山东)新材料有限责任公司 2024-12-27 CN claimed
US-20240294689-A1 SUPER ADVANCED CONTROLLED RADICAL POLYMERIZATION BASF COATINGS GMBH (DE) 2024-09-05 US claimed
US-4256873-A CATALYTICALLY REACTING FINE SILICA AND A POLYHYDROXIDE TO PRODUCE AN ORGANIC HYDROXY SILICATE WHICH CAN MODIFY RESINS OF POLYURETHANE, -ESTERS, ETHERS, AND ADDITION POLYMERS; TOUGH PROTECTIVE COATINGS; FOAMS BLOUNT DAVID H 1981-03-17 US claimed
US-4248939-A OVERCOATING WITH AN ORGANIC PIGMENT WHICH IS A GRAFT POLYMER OF UNSATURATED MONOMERS AND PREPOLYMERS HERCULES INCORPORATED (US) 1981-02-03 US claimed
US-4235982-A POLYMERIC FILLERS FOR PAPER HERCULES, INCORPORATED (US) 1980-11-25 US claimed
US-4201702-A Process to produce allyl halides copolymers BLOUNT DAVID H 1980-05-06 US claimed
US-4133907-A POLYMETHYL CHLOROACRYLATE TEXAS INSTRUMENTS INCORPORATED (US) 1979-01-09 US claimed
US-4117235-A NOVEL PREPARATION OF NOVEL LOW MOLECULAR WEIGHT, LIQUID POLYMER OWENS-ILLINOIS, INC. (US) 1978-09-26 US claimed
US-4113693-A Process for the production of acrylic compounds and resinous products BLOUNT DAVID H 1978-09-12 US claimed
US-4107062-A Toner for developing electrostatic latent images comprising an amine-epoxy resin mixture KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1978-08-15 US claimed
US-4011351-A HIGH ENERGY RADIATION, PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1977-03-08 US claimed
US-3964955-A Bonding method using olefin-acrylic ester copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-06-22 US claimed