SCHEMBL3961910

SCHEMBL3961910

C=CC(C)=C(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2722611 0.79
SCHEMBL2722613 0.79
SCHEMBL14382366 0.79
SCHEMBL16703071 0.77
SCHEMBL28222212 0.77
SCHEMBL316456 0.72
SCHEMBL30053726 0.72
SCHEMBL18712800 0.72
SCHEMBL618665 0.70
SCHEMBL15444009 0.69 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10040892-B2 Polyurethane elastic yarn and production method thereof INVISTA NORTH AMERICA S.A R.L. (US) 2018-08-07 US claimed
EP-1149856-B1 Use as a primer SIKA SCHWEIZ AG (CH) 2005-06-08 EP claimed
EP-0673983-B1 Waterborne polyester paint NIPPON PAINT CO LTD (JP) 1999-07-21 EP claimed
US-5919856-A POLYESTER RESIN HAVING A NUMBER OF PENDANT CARBOXYL GROUPS AND A CROSSLINKER; AS POLYESTER-FORMING POLYHYDRIC ALCOHOL REACTANTS FROM 1 TO 40% OF A POLYALKADIENEDIOL OR A HYDROGENATED PRODUCTS THEREOF AND FROM 2 TO 50% OF A NIPPON PAINT CO., LTD. (JP) 1999-07-06 US claimed
EP-0849341-A2 Water-based coating compositions and coating method using the same NIPPON PAINT CO., LTD. (JP) 1998-06-24 EP claimed
US-5597861-A WATER BASED PAINT WITH CROSSLINKED POLYESTERETHER COPOLYMERS AND NEUTRALIZING BASE NIPPON PAINT COMPANY, LTD. (JP) 1997-01-28 US claimed
EP-0673983-A1 Waterborne polyester paint NIPPON PAINT CO., LTD. (JP) 1995-09-27 EP claimed
US-20250188498-A1 GENETICALLY MODIFIED PSEUDOMONAS HOST CELLS AND METHODS USEFUL FOR PRODUCING ISOPRENOL U.S. DEPARTMENT OF ENERGY 2025-06-12 US disclosed
CN-118338888-A Surfactant composition for cosmetic material and cosmetic material 三洋化成工业株式会社 2024-07-12 CN disclosed
US-12024578-B2 Curable composition NITTO SHINKO CORPORATION (JP) 2024-07-02 US disclosed
EP-3584870-B1 SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET AND METHOD FOR PRODUCING SAME, ALL-SOLID SECONDARY BATTERY AND METHOD FOR PRODUCING SAME, AND POLYMER AND NON-AQUEOUS SOLVENT DISPERSION THEREOF FUJIFILM CORP (JP) 2024-04-17 EP disclosed
US-11952502-B2 Textile printing ink set and textile printing method FUJIFILM CORPORATION (JP) 2024-04-09 US disclosed
US-20240067810-A1 FLEXIBLE METAL CLAD LAMINATES AND METHODS OF PREPARATION THEREOF Kraton Corporation (US) 2024-02-29 US disclosed
US-5304630-A Production processes of arylene thioether oligomer and copolymer KUREHA KAGAKU KOGYO K.K. (JP) 1994-04-19 US disclosed
US-5262517-A Production processes of arylene thioether oligomer and copolymer KUREHA KAGAKU KOGYO K.K. (JP) 1993-11-16 US disclosed
US-5166309-A Copolymerization of organoamidediacid A with oligoetherdiol B ELF ATOCHEM S.A. (FR) 1992-11-24 US disclosed
EP-0511641-A2 Resin for bonding polyarylene sulfide and adhesive KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-11-04 EP disclosed
EP-0508705-A2 Processes for the production of arylene thioether oligomers and copolymers KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-10-14 EP disclosed
US-4435558-A Hardenable urethane-epoxy resin mixtures SCHERING AG (DE) 1984-03-06 US disclosed
US-4408034-A HIGH SPEED, TERTIARY AMINE, VAPOR PHASE TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1983-10-04 US disclosed