SCHEMBL3962458

SCHEMBL3962458

C=C[CH]OCc1ccc(OC)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.55
ALDH1A1 P00352 1/20 0.55
TP53 P04637 1/20 0.55
CYP3A4 P08684 1/20 0.55
ALOX15 P16050 1/20 0.55
TSHR P16473 1/20 0.55
ALOX12 P18054 1/20 0.55
IDO1 P14902 3/20 0.52
AGXT P21549 2/20 0.52
APP P05067 5/20 0.46
MAOB P27338 1/20 0.44
APLNR P35414 1/20 0.44
CALM1 P0DP23 1/20 0.43
LTA4H P09960 1/20 0.42
TAAR1 Q96RJ0 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL917734 0.84 SMN1; SMN2 (0.59) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL7189732 0.78 IDO1 (0.57) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL6342 0.76 IDO1 (0.55) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL2245603 0.76 IDO1 (0.55) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL17599989 0.76 IDO1 (0.50) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL292605 0.75 TSHR (0.48) SMN1; SMN2ALDH1A1ALOX15TSHRIDO1
SCHEMBL5190106 0.75 TSHR (0.48) SMN1; SMN2ALDH1A1ALOX15TSHRIDO1
SCHEMBL9982766 0.74 SMN1; SMN2 (0.57) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
Iodide SCHEMBL9356671 0.74 IDO1 (0.53) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15
SCHEMBL28552476 0.74 IDO1 (0.53) SMN1; SMN2ALDH1A1TP53CYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed