Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL875150 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25292878 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL5595336 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25287606 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL23430060 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25255863 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25285896 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL25301943 | 0.85 | CA1 (0.44) | GPR3CA1CA2CA7CA13 | |
| Trifluoromethanesulfonic Acid SCHEMBL20570425 | 0.85 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25292546 | 0.85 | GPR3 (0.48) | GPR3CA1CA2CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090186484-A1 | PATTERN FORMATION METHOD | PANASONIC CORPORATION (JP) | 2009-07-23 | — | — | US | disclosed |
| US-7524772-B2 | Pattern formation method | PANASONIC CORPORATION (JP) | 2009-04-28 | — | — | US | disclosed |
| US-20070128558-A1 | Pattern formation method and exposure system | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-07 | — | — | US | disclosed |
| US-7094521-B2 | Pattern formation method and exposure system | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-08-22 | — | — | US | disclosed |
| US-20060160032-A1 | Pattern formation method and exposure system | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-07-20 | — | — | US | disclosed |
| US-20060040215-A1 | Amplification; exposure to radiation while aqueous solution of triphenylsulfonium nonaflate | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-02-23 | — | — | US | disclosed |
| US-6992015-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-01-31 | — | — | US | disclosed |
| US-20040224525-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-11 | — | — | US | disclosed |