Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3GNRHRMPLPDE3APDE3BPDE4APDE4BPDE4CPDE4DPPARASLC5A2
The experimentally established mechanism targets of Choline. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.86 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.86 |
| ▸ | LMNA | P02545 | 3/20 | 0.86 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.86 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.86 |
| ▸ | ACHE | P22303 | 4/20 | 0.41 |
| ▸ | APEX1 | P27695 | 3/20 | 0.41 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.38 |
| ▸ | APAF1 | O14727 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | RAD52 | P43351 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Choline SCHEMBL28091936 | 1.00 | MEN1 (0.86) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL3784390 | 1.00 | — | — | |
| Choline SCHEMBL23036016 | 1.00 | — | — | |
| Choline SCHEMBL396924 | 0.96 | MEN1 (0.80) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL8588331 | 0.96 | — | — | |
| Choline SCHEMBL30084682 | 0.96 | CYP3A4 (0.93) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL5533745 | 0.96 | CYP3A4 (0.93) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL20490076 | 0.96 | MEN1 (0.80) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL20527931 | 0.96 | — | — | |
| Choline SCHEMBL30473273 | 0.96 | CYP3A4 (0.93) | MEN1KMT2ALMNACYP3A4SLC5A7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109694091-B | Preparation method of IWR/CDO cocrystallized zeolite molecular sieve | 中国石油化工股份有限公司 | 2020-10-30 | — | — | CN | claimed |
| CN-109694091-B | Preparation method of IWR/CDO cocrystallized zeolite molecular sieve | 中国石油化工股份有限公司 | 2020-10-30 | — | — | CN | disclosed |
| US-9476019-B2 | Cleaning agent for semiconductor provided with metal wiring | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2016-10-25 | — | — | US | disclosed |
| US-9334470-B2 | Cleaning liquid composition for electronic device | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2016-05-10 | — | — | US | disclosed |
| US-20150259632-A1 | CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2015-09-17 | — | — | US | disclosed |
| US-9045717-B2 | Cleaning agent for semiconductor provided with metal wiring | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-06-02 | — | — | US | disclosed |
| US-20130203643-A1 | CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-08-08 | — | — | US | disclosed |
| US-20130143785-A1 | CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2013-06-06 | — | — | US | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110192452-A1 | PHOTOELECTRIC CONVERSION DEVICE AND FABRICATION METHOD THEREOF | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| WO-2011094568-A2 | CLEANING AGENT FOR SEMICONDUCTOR PROVIDED WITH METAL WIRING | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-08-04 | — | — | WO | disclosed |
| US-20110180747-A1 | Trioka Acid Semiconductor Cleaning Compositions and Methods of Use | LASERWORT LTD (HK) | 2011-07-28 | — | — | US | disclosed |
| US-7947130-B2 | Troika acid semiconductor cleaning compositions and methods of use | LASERWORT LTD (HK) | 2011-05-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20110094536-A1 | Troika Acid Semiconductor Cleaning Compositions and Methods of Use | Lee, Wai Mun (US) | 2011-04-28 | — | — | US | disclosed |
| CN-100341992-C | Composition and method for removing residues from semiconductor manufacturing | EKC TECHNOLOGY INC (US) | 2007-10-10 | — | — | CN | disclosed |
| CN-1465687-A | Composition and method for removing residues from semiconductor manufacturing | EKC������˾ | 2004-01-07 | — | — | CN | disclosed |
| US-5968848-A | SALT OF HYDROFLUORIC ACID AND A METALLIC-ION-FREE BASE SUCH AS AN ORGANIC AMINE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-10-19 | — | — | US | disclosed |