SCHEMBL396515

SCHEMBL396515

c1ccc(C(OC(c2ccccc2)(c2ccccc2)c2ccc(C(c3ccccc3)(c3ccccc3)c3ccccc3)cc2)(c2ccccc2)c2ccc(C(c3ccccc3)(c3ccccc3)c3ccccc3)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 2/20 0.41
MAPK1 P28482 1/20 0.39
KCNN4 O15554 5/20 0.38
ALDH1A1 P00352 3/20 0.38
TSHR P16473 2/20 0.38
ALOX15 P16050 1/20 0.36
ESR1 P03372 2/20 0.34
ESR2 Q92731 2/20 0.34
CYP3A4 P08684 1/20 0.34
CYP1A2 P05177 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31
MAPT P10636 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
PTPN1 P18031 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8973 0.89 KIF11 (0.48) KIF11MAPK1KCNN4ALDH1A1TSHR
Bromide SCHEMBL28557682 0.86 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
Ammonia Solution, Strong SCHEMBL23726528 0.86 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
Hydrochloric Acid SCHEMBL28556207 0.86 KIF11 (0.46) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL9846771 0.83 KCNN4 (0.50) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL5750056 0.80 KIF11 (0.46) KIF11MAPK1ALDH1A1TSHRALOX15
SCHEMBL6269944 0.80 KIF11 (0.39) KIF11MAPK1KCNN4ALDH1A1TSHR
SCHEMBL28958532 0.80 ESR1 (0.58) KIF11ALDH1A1TSHRALOX15ESR1
SCHEMBL8805717 0.80 KIF11 (0.46) KIF11MAPK1ALDH1A1TSHRALOX15
SCHEMBL230628 0.80 KCNN4 (0.53) MAPK1KCNN4ALDH1A1TSHRALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999623-B2 Degradable neutral layers for block copolymer lithography applications WISCOUSIN ALUMNI RESEARCH FOUNDATION (US) 2015-04-07 US disclosed
US-20140263164-A1 DEGRADABLE NEUTRAL LAYERS FOR BLOCK COPOLYMER LITHOGRAPHY APPLICATIONS WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2014-09-18 US disclosed
US-8641914-B2 Methods of improving long range order in self-assembly of block copolymer films with ionic liquids MICRON TECHNOLOGY, INC. (US) 2014-02-04 US disclosed
US-8101261-B2 One-dimensional arrays of block copolymer cylinders and applications thereof MICRON TECHNOLOGY, INC. (US) 2012-01-24 US disclosed
EP-2254827-B1 METHODS OF IMPROVING LONG RANGE ORDER IN SELF-ASSEMBLY OF BLOCK COPOLYMER FILMS WITH IONIC LIQUIDS MICRON TECHNOLOGY INC (US) 2011-09-28 EP disclosed
EP-2281299-A1 THERMAL ANNEAL OF A BLOCK COPOLYMER FILMS WITH TOP INTERFACE CONSTRAINED TO WET BOTH BLOCKS WITH EQUAL PREFERENCE Micron Technology, Inc. (US) 2011-02-09 EP disclosed
US-4379843-A Immobilization of polynucleotides and polypeptides with tritylated polysaccharides CASHION PETER 1983-04-12 US disclosed