SCHEMBL3966417

SCHEMBL3966417

O=C1C2=C(Nc3ccccc3)CCC(Nc3ccccc3)=C2C(=O)c2ccccc21

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 12/20 0.50
MEN1 O00255 10/20 0.50
KMT2A Q03164 10/20 0.50
LMNA P02545 8/20 0.50
SMN1; SMN2 Q16637 6/20 0.50
NPC1 O15118 5/20 0.50
HTT P42858 5/20 0.50
MAPK1 P28482 5/20 0.50
RAB9A P51151 4/20 0.50
MITF O75030 3/20 0.50
NPSR1 Q6W5P4 3/20 0.50
GAA P10253 3/20 0.50
ATM Q13315 2/20 0.50
XBP1 P17861 1/20 0.50
L3MBTL1 Q9Y468 4/20 0.49
ALDH1A1 P00352 4/20 0.49
APAF1 O14727 3/20 0.49
BLM P54132 2/20 0.49
NFKB1 P19838 1/20 0.49
NFKB2 Q00653 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthraquinone SCHEMBL28323700 0.77 MEN1 (0.63) MAPTMEN1KMT2ALMNASMN1; SMN2
Anthraquinone SCHEMBL28378374 0.77 MEN1 (0.63) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL81437 0.76 MAPT (0.50) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL7912341 0.74 MAPT (0.73) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL11275276 0.74 MAPT (0.51) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL7918722 0.73 MAPT (0.62) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL7913503 0.71 MAPT (0.61) MAPTMEN1KMT2ALMNASMN1; SMN2
Dichlon SCHEMBL6439548 0.69 MAPT (0.78) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL14003716 0.68 CDC25B (0.73) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL595104 0.68 P2RY12 (0.56) MAPTMEN1KMT2ALMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1765592-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Agfa Graphics N.V. (BE) 2007-03-28 EP disclosed
WO-2006005688-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. AGFA-GEVAERT (BE) 2006-01-19 WO disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed
US-4090877-A COLOR PHOTOGRAPHY MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-05-23 US disclosed