⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL396531 | 0.98 | — | — | |
| SCHEMBL9714986 | 0.92 | — | — | |
| SCHEMBL1046020 | 0.83 | — | — | |
| SCHEMBL1045069 | 0.83 | — | — | |
| SCHEMBL9411485 | 0.83 | — | — | |
| SCHEMBL10787860 | 0.82 | — | — | |
| SCHEMBL393243 | 0.81 | — | — | |
| SCHEMBL395765 | 0.80 | — | — | |
| SCHEMBL396765 | 0.79 | — | — | |
| SCHEMBL9111163 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8969429-B2 | Low-tack, hydrophobic ophthalmic device materials | NOVARTIS AG (CH) | 2015-03-03 | — | — | US | claimed |
| EP-2673666-B1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | NOVARTIS AG (CH) | 2014-12-31 | — | — | EP | claimed |
| EP-2673666-A1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | Novartis AG (CH) | 2013-12-18 | — | — | EP | claimed |
| WO-2012109228-A1 | LOW-TACK, HYDROPHOBIC OPHTHALMIC DEVICE MATERIALS | NOVARTIS AG (CH) | 2012-08-16 | — | — | WO | claimed |
| US-20120202916-A1 | Low-Tack, Hydrophobic Ophthalmic Device Materials | NOVARTIS AG (CH) | 2012-08-09 | — | — | US | claimed |
| US-7816464-B2 | Polymer particle dispersion, cosmetic composition comprising it and cosmetic process using it | L'OREAL, S.A. (FR) | 2010-10-19 | — | — | US | claimed |
| EP-4749682-A1 | CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20260140445-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-21 | — | — | US | disclosed |
| US-20260126725-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | CANON KK (JP) | 2026-05-07 | — | — | US | disclosed |
| EP-4738008-A1 | CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260117010-A1 | CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20250312951-A1 | MOLD, MANUFACTURING METHOD, FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD AND IMPRINT APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2025-10-09 | — | — | US | disclosed |
| US-7083831-B1 | Chromium-free corrosion preventive and corrosion prevention method | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) | 2006-08-01 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| EP-1187882-A1 | CHROMIUM-FREE CORROSION PREVENTIVE AND CORROSION PREVENTION METHOD | Henkel Kommanditgesellschaft auf Aktien (DE) | 2002-03-20 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |
| WO-2000069978-A1 | CHROMIUM-FREE CORROSION PREVENTIVE AND CORROSION PREVENTION METHOD | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2000-11-23 | — | — | WO | disclosed |