Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | TP53 | P04637 | 3/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL397194 | 0.85 | TSHR (0.44) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL6037080 | 0.83 | TSHR (0.41) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL394436 | 0.82 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL3915993 | 0.80 | TSHR (0.47) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL30784998 | 0.77 | TSHR (0.53) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL3914586 | 0.77 | TSHR (0.44) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL3915278 | 0.77 | TSHR (0.48) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL29939024 | 0.76 | TSHR (0.51) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL15864750 | 0.75 | TSHR (0.49) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL4883024 | 0.74 | TSHR (0.42) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7816464-B2 | Polymer particle dispersion, cosmetic composition comprising it and cosmetic process using it | L'OREAL, S.A. (FR) | 2010-10-19 | — | — | US | claimed |
| US-7282550-B2 | Composition to provide a layer with uniform etch characteristics | MOLECULAR IMPRINTS, INC. (US) | 2007-10-16 | — | — | US | claimed |
| US-20060035029-A1 | Method to provide a layer with uniform etch characteristics | MOLECULAR IMPRINTS, INC. (US) | 2006-02-16 | — | — | US | claimed |
| US-20060036051-A1 | Composition to provide a layer with uniform etch characteristics | MOLECULAR IMPRINTS, INC. (US) | 2006-02-16 | — | — | US | claimed |
| US-11029597-B2 | Method for producing pattern laminate, method for producing reversal pattern, and pattern laminate | FUJIFILM CORPORATION (JP) | 2021-06-08 | — | — | US | disclosed |
| US-20180364566-A1 | METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSAL PATTERN, AND PATTERN LAMINATE | FUJIFILM CORPORATION (JP) | 2018-12-20 | — | — | US | disclosed |
| US-8110697-B2 | Method for the production of polymerizable silicones | WACKER CHEMIE AG (DE) | 2012-02-07 | — | — | US | disclosed |
| US-8101789-B2 | Method for the production of polymerizable silicones | WACKER CHEMIE AG (DE) | 2012-01-24 | — | — | US | disclosed |
| US-7939131-B2 | Method to provide a layer with uniform etch characteristics | MOLECULAR IMPRINTS, INC. (US) | 2011-05-10 | — | — | US | disclosed |
| EP-2125833-B1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | WACKER CHEMIE AG (DE) | 2010-08-25 | — | — | EP | disclosed |
| EP-2125834-B1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | WACKER CHEMIE AG (DE) | 2010-08-25 | — | — | EP | disclosed |
| US-20100041909-A1 | METHOD FOR THE PRODUCTION OF POLYMERIZABLE SILICONES | WACKER CHEMIE AG (DE) | 2010-02-18 | — | — | US | disclosed |
| US-7241395-B2 | Reverse tone patterning on surfaces having planarity perturbations | MOLECULAR IMPRINTS, INC. (US) | 2007-07-10 | — | — | US | disclosed |
| US-7205244-B2 | Patterning substrates employing multi-film layers defining etch-differential interfaces | MOLECULAR IMPRINTS (US) | 2007-04-17 | — | — | US | disclosed |
| US-7041604-B2 | Method of patterning surfaces while providing greater control of recess anisotropy | MOLECULAR IMPRINTS, INC. (US) | 2006-05-09 | — | — | US | disclosed |
| US-20060063387-A1 | Method of Patterning Surfaces While Providing Greater Control of Recess Anisotropy | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | disclosed |
| US-20060060557-A1 | Reverse tone patterning on surfaces having surface planarity perturbations | CITIBANK, N.A. | 2006-03-23 | — | — | US | disclosed |
| US-20060063112-A1 | Pattern reversal employing thick residual layers | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | disclosed |
| US-20060063359-A1 | Patterning substrates employing multi-film layers defining etch differential interfaces | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | disclosed |
| US-20060063277-A1 | Method of forming an in-situ recessed structure | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | disclosed |