Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Silver. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.37 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.31 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.31 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.30 |
| ▸ | CPT2 | P23786 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Zinc Ion SCHEMBL245619 | 0.95 | CA4 (0.37) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| SCHEMBL246365 | 0.95 | CA4 (0.37) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| Silver SCHEMBL6733904 | 0.84 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| SCHEMBL10887183 | 0.78 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| SCHEMBL4624370 | 0.78 | CA4 (0.50) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| Potassium Ion SCHEMBL9819337 | 0.78 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| SCHEMBL10887232 | 0.78 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| T-Butylacetic Acid SCHEMBL11218671 | 0.78 | — | — | |
| SCHEMBL666362 | 0.78 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 | |
| SCHEMBL6733912 | 0.78 | CA4 (0.43) | CA4FFAR3HDAC3HDAC1HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112913012-B | Method for manufacturing electromagnetic interference shielding layer | 贺利氏德国有限两合公司 | 2024-07-26 | — | — | CN | disclosed |
| US-11848276-B2 | Method of manufacturing an electromagnetic interference shielding layer | HERAEUS ELECTRONICS GMBH & CO. KG (DE) | 2023-12-19 | — | — | US | disclosed |
| US-20210358861-A1 | METHOD OF MANUFACTURING AN ELECTROMAGNETIC INTERFERENCE SHIELDING LAYER | Heraeus Deutschland GmbH & Co. KG (DE) | 2021-11-18 | — | — | US | disclosed |
| EP-3878009-A1 | METHOD OF MANUFACTURING AN ELECTROMAGNETIC INTERFERENCE SHIELDING LAYER | Heraeus Deutschland GmbH & Co KG (DE) | 2021-09-15 | — | — | EP | disclosed |
| CN-112913012-A | Method for manufacturing electromagnetic interference shielding layer | 贺利氏德国有限两合公司 | 2021-06-04 | — | — | CN | disclosed |
| US-20200260593-A1 | METHOD OF FORMING A SOLDER CONNECTION AND CARRIER WITH A COMPONENT FIXED TO THE CARRIER BY A SOLDER CONNECTION | FM SIEBDRUCK WERBUNG DESIGN GMBH (DE) | 2020-08-13 | — | — | US | disclosed |
| EP-3648161-A1 | METHOD OF MANUFACTURING AN ELECTROMAGNETIC INTERFERENCE SHIELDING LAYER | Heraeus Deutschland GmbH & Co KG (DE) | 2020-05-06 | — | — | EP | disclosed |
| EP-1880412-B1 | METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS | LG CHEMICAL LTD (KR) | 2017-11-29 | — | — | EP | disclosed |
| CN-101176193-B | Method for forming high-resolution pattern with direct writing means | LG CHEMICAL LTD | 2011-04-13 | — | — | CN | disclosed |
| WO-2006121298-A9 | METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS | LG CHEMICAL LTD (KR) | 2009-06-04 | — | — | WO | disclosed |
| US-7510951-B2 | Method for forming high-resolution pattern with direct writing means | LG CHEM, LTD. (KR) | 2009-03-31 | — | — | US | disclosed |
| CN-101176193-A | Method for forming high-resolution pattern with direct writing means | LG CHEMICAL LTD (KR) | 2008-05-07 | — | — | CN | disclosed |
| EP-1880412-A1 | METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS | LG Chem, Ltd. (KR) | 2008-01-23 | — | — | EP | disclosed |
| US-20060281333-A1 | Method for forming high-resolution pattern with direct writing means | LG CHEM, LTD. (KR) | 2006-12-14 | — | — | US | disclosed |
| WO-2006121298-A1 | METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS | LG CHEM, LTD. (KR) | 2006-11-16 | — | — | WO | disclosed |