Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27996469 | 0.86 | ALDH1A1 (0.47) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL28091716 | 0.81 | ALDH1A1 (0.48) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL448848 | 0.80 | — | — | |
| SCHEMBL7170116 | 0.72 | ALDH1A1 (0.60) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL4230859 | 0.70 | TSHR (0.45) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL27889354 | 0.70 | TSHR (0.46) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL23175186 | 0.70 | ALDH1A1 (0.48) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL4226688 | 0.69 | TSHR (0.44) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL4221260 | 0.69 | TSHR (0.44) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 | |
| SCHEMBL23175181 | 0.68 | ALDH1A1 (0.42) | ALDH1A1SMN1; SMN2TDP1TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6115171-A | Electrochromic device | NIPPON MITSUBISHI OIL CORPORATION (JP) | 2000-09-05 | — | — | US | claimed |
| US-11038145-B2 | Laminated film and process for manufacturing the same, as well as method for analyzing laminated film | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-06-15 | — | — | US | disclosed |
| CN-107331784-B | Laminated film and method for producing same | 住友化学株式会社 | 2020-11-27 | — | — | CN | disclosed |
| US-20170288170-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170288169-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME, AS WELL AS METHOD FOR ANALYZING LAMINATED FILM | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9646940-B2 | Gas barrier film and electronic device | Konica Minolta, Inc. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160272883-A1 | COATED SEMICONDUCTOR NANOPARTICLE AND METHOD FOR MANUFACTURING THE SAME | Konica Minolta, Inc. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3070143-A1 | COATED SEMICONDUCTOR NANOPARTICLE AND METHOD FOR MANUFACTURING THE SAME | Konica Minolta, Inc. (JP) | 2016-09-21 | — | — | EP | disclosed |
| US-20160186009-A1 | GAS BARRIER FILM | Konica Minolta, Inc. (JP) | 2016-06-30 | — | — | US | disclosed |
| US-9362524-B2 | Method for producing gas barrier film, gas barrier film, and electronic device | Konica Minolta, Inc. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-20090053526-A1 | GAS BARRIER LAMINATE AND PRODUCTION METHOD OF THE SAME | KONICA MINOLTA HOLDINGS, INC. (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-2011639-A1 | GAS BARRIER FILM, RESIN BASE FOR ORGANIC ELECTROLUMINESCENT DEVICE, ORGANIC ELECTROLUMINESCENT DEVICE USING THE SAME, AND METHOD FOR PRODUCING GAS BARRIER FILM | KONICA MINOLTA HOLDINGS, INC. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-0913446-B1 | ULTRAVIOLET ABSORBING MATERIAL AND ULTRAVIOLET ABSORBING PLATE | NIPPON MITSUBISHI OIL CORP (JP) | 2008-08-20 | — | — | EP | disclosed |
| EP-1785266-A1 | GAS BARRIER MULTILAYER BODY AND METHOD FOR PRODUCING SAME | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-05-16 | — | — | EP | disclosed |
| US-20060205237-A1 | Preparation of semiconductor device | SHIN-ETSU CHEMICAL CO, LTD. | 2006-09-14 | — | — | US | disclosed |
| US-6190777-B1 | AMIDE FORMED FROM A CARBOXY-CONTAINING UV ABSORBING COMPOUND AND AN AMINOALKYLSILANE | NIPPON MITSUBISHI OIL CORPORATION (JP) | 2001-02-20 | — | — | US | disclosed |
| EP-0700951-B1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KK (JP) | 2000-12-27 | — | — | EP | disclosed |
| EP-0913446-A1 | ULTRAVIOLET ABSORBING MATERIAL AND ULTRAVIOLET ABSORBING PLATE | Nippon Oil Co., Ltd. (JP) | 1999-05-06 | — | — | EP | disclosed |
| EP-0700951-A1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1996-03-13 | — | — | EP | disclosed |
| US-5491203-A | COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS | SHOWA DENKO K. K. (JP) | 1996-02-13 | — | — | US | disclosed |