Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.32 |
| ▸ | ADH1B | P00325 | 1/20 | 0.31 |
| ▸ | ADH1C | P00326 | 1/20 | 0.31 |
| ▸ | ADH1A | P07327 | 1/20 | 0.31 |
| ▸ | ADH4 | P08319 | 1/20 | 0.31 |
| ▸ | ADH7 | P40394 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15226793 | 0.87 | SIGMAR1 (0.47) | SIGMAR1CYP1A2 | |
| SCHEMBL8398837 | 0.80 | CYP1A2 (0.44) | SIGMAR1CYP1A2NFE2L2ADH1BADH1C | |
| SCHEMBL1815340 | 0.76 | SIGMAR1 (0.33) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL9719593 | 0.74 | CYP1A2 (0.44) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL11772642 | 0.74 | CYP1A2 (0.39) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL9719568 | 0.74 | CYP1A2 (0.39) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL7264765 | 0.74 | SIGMAR1 (0.41) | SIGMAR1CYP1A2NFE2L2ADH1BADH1C | |
| SCHEMBL7031133 | 0.74 | CYP1A2 (0.44) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL11772648 | 0.74 | CYP1A2 (0.39) | SIGMAR1CYP1A2ADH1BADH1CADH1A | |
| SCHEMBL10368761 | 0.73 | CYP1A2 (0.38) | SIGMAR1CYP1A2ADH1BADH1CADH1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111758074-A | Photosensitive layer, laminate, photosensitive resin composition, kit, and method for producing photosensitive resin composition | 富士胶片株式会社 | 2020-10-09 | — | — | CN | disclosed |
| US-20130230770-A1 | NON-AQUEOUS SECONDARY BATTERY | HITACHI MAXELL, LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-7501223-B2 | Polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080090179-A1 | Novel polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-6887645-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20020061462-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| EP-1193555-A1 | Negative resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |