SCHEMBL3988292

SCHEMBL3988292

C=CC(=O)OCCOC(=O)CC#N

nearest known ligand 0.55

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.55
ALDH1A1 P00352 4/20 0.55
TP53 P04637 3/20 0.55
HIF1A Q16665 3/20 0.55
HSD17B10 Q99714 1/20 0.55
CYP3A4 P08684 2/20 0.50
THRB P10828 2/20 0.46
HPGD P15428 1/20 0.46
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MCL1 Q07820 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23583597 0.95 TSHR (0.66) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL12085149 0.93 TSHR (0.62) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL6890414 0.83 MCL1 (0.43) MCL1
SCHEMBL18854246 0.81 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10049473 0.81 ALDH1A1 (0.32) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL7541419 0.79 TSHR (0.48) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL93462 0.78 TSHR (0.84) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL30604742 0.78 TSHR (0.84) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL33946 0.78
SCHEMBL5090096 0.78 MCL1 (0.36) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7560519-B2 Dual-stage wafer applied underfills LORD CORPORATION (US) 2009-07-14 US claimed
EP-0492210-B1 Polymer-coated concrete BASF AG (DE) 1994-09-21 EP claimed
US-5215827-A Acrylic amide or ester copolymers BASF AKTIENGESELLSCHAFT (DE) 1993-06-01 US claimed
CN-111148813-B One-part polymer modifier 阿科玛股份有限公司 2024-03-22 CN disclosed
WO-2021131507-A1 OPTICAL LAMINATE AND IMAGE DISPLAYING DEVICE 住友化学株式会社 2021-07-01 WO disclosed
WO-2021131505-A1 OPTICAL LAMINATE AND IMAGE DISPLAY DEVICE 住友化学株式会社 2021-07-01 WO disclosed
EP-2217557-B1 ACTIVATED METHYLENE REAGENTS Henkel IP & Holding GmbH (DE) 2018-01-24 EP disclosed
US-9082840-B2 Coating adhesives onto dicing before grinding and micro-fabricated wafers Henkel IP & Holding GmbH (DE) 2015-07-14 US disclosed
US-20140242781-A1 COATING ADHESIVES ONTO DICING BEFORE GRINDING AND MICRO-FABRICATED WAFERS Henkel IP & Holding GmbH (DE) 2014-08-28 US disclosed
US-8791033-B2 Wafer backside coating process with pulsed UV light source Henkel IP & Holding GmbH (DE) 2014-07-29 US disclosed
US-8753959-B2 Coating adhesives onto dicing before grinding and micro-fabricated wafers Henkel IP & Holding GmbH (DE) 2014-06-17 US disclosed
EP-0679933-B1 Silver halide photographic material and method of processing the same FUJI PHOTO FILM CO LTD (JP) 1998-02-11 EP disclosed
US-5677117-A HAVING EMULSION LAYER COMPRISING SILVER HALIDE GRAINS SENSITIZED WITH SELENIUM OR TELLURIUM COMPOUND, CONTAINING POLYMER LATEX HAVING ACTIVE METHYLENE GROUP FUJI PHOTO FILM CO., LTD. (JP) 1997-10-14 US disclosed
US-5587276-A HYDROQUINONE-FREE DEVELOPING SOLUTION CONTAINING ASCORBIC ACID; HYDROPHILIC COLLOIDAL LAYER CONTAINING A HYDRAZINE DERIVATIVE FUJI PHOTO FILM CO., LTD. (JP) 1996-12-24 US disclosed
EP-0726489-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1996-08-14 EP disclosed
EP-0716338-A2 Fine polymer particles having heterogeneous phase structure, silver halide photographic light- sensitive material containing the fine polymer particles and image-forming method FUJI PHOTO FILM CO., LTD. (JP) 1996-06-12 EP disclosed
EP-0679933-A1 Silver halide photographic material and method of processing the same FUJI PHOTO FILM CO., LTD. (JP) 1995-11-02 EP disclosed
EP-0017703-A1 Copolymerizable (2-cyano-3,3-diarylacryloxy)alkylene compounds, a method of making them and the use of these compounds as ultraviolet light absorbers GAF CORPORATION (US) 1980-10-29 EP disclosed
US-4218392-A Two-step method of making copolymerizable, ultraviolet light absorber _2-cyano-3,3-diphenylacryloxy) alkylene acrylic acid esters GAF CORPORATION (US) 1980-08-19 US disclosed
US-4178303-A (2-Cyano-3,3-diphenylacryloxy) alkylene acrylic acid esters GAF CORPORATION (US) 1979-12-11 US disclosed