Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | HMGCR | P04035 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.38 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.31 |
| ▸ | LCK | P06239 | 1/20 | 0.31 |
| ▸ | FYN | P06241 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1195464 | 0.93 | TSHR (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL27667108 | 0.76 | TSHR (0.53) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL29373 | 0.72 | — | — | |
| SCHEMBL1618313 | 0.72 | ALDH1A1 (1.00) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL38460 | 0.72 | — | — | |
| SCHEMBL5464430 | 0.71 | ALDH1A1 (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL1953736 | 0.71 | TSHR (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL10949463 | 0.71 | TSHR (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL1953738 | 0.71 | TSHR (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R | |
| SCHEMBL2102481 | 0.71 | TSHR (0.56) | TSHRALDH1A1HMGCRCHRM1TBXA2R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7550254-B2 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-23 | — | — | US | disclosed |
| US-20070202440-A1 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-30 | — | — | US | disclosed |
| US-7261992-B2 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-28 | — | — | US | disclosed |
| US-20020090572-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES U.S. INC. | 2002-07-11 | — | — | US | disclosed |
| US-20020081520-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES INC. (KY) | 2002-06-27 | — | — | US | disclosed |