SCHEMBL4002206

SCHEMBL4002206

CN(CC(=O)O)c1cc(S)nc(S)n1

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.32
▸ CA1 P00915 1/20 0.32
▸ CA2 P00918 1/20 0.32
▸ CA9 Q16790 1/20 0.32
▸ HIF1A Q16665 1/20 0.32
▸ EGFR P00533 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17351197 0.98 CA12 (0.32) CA12CA1CA2CA9HIF1A
SCHEMBL13651787 0.83 CA12 (0.32) CA12CA1CA2CA9HIF1A
SCHEMBL13651828 0.83 TDP1 (0.30) —
SCHEMBL4649954 0.77 PIK3CA (0.38) CA12CA1CA2CA9HIF1A
SCHEMBL13651815 0.75 SCN9A (0.45) —
SCHEMBL30831295 0.68 EGFR (0.32) CA12CA1CA2CA9HIF1A
SCHEMBL29087986 0.66 KDM4E (0.45) —
SCHEMBL3144894 0.65 PIK3CA (0.38) CA12CA1CA2CA9
SCHEMBL2314290 0.65 EGFR (0.44) EGFR
SCHEMBL13651832 0.64 ALOX15 (0.50) HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9485856-B2 Transparent electrode sheet, method for manufacturing transparent electrode sheet, and capacitive touch panel using such transparent electrode sheet FUJIFILM CORPORATION (JP) 2016-11-01 — — US disclosed
US-9485856-B2 Transparent electrode sheet, method for manufacturing transparent electrode sheet, and capacitive touch panel using such transparent electrode sheet FUJIFILM CORPORATION (JP) 2016-11-01 — — US disclosed
US-9389503-B2 Manufacturing method of conductive sheet and conductive sheet FUJIFILM CORPORATION (JP) 2016-07-12 — — US disclosed
US-9389503-B2 Manufacturing method of conductive sheet and conductive sheet FUJIFILM CORPORATION (JP) 2016-07-12 — — US disclosed
US-20150234271-A1 MANUFACTURING METHOD OF CONDUCTIVE SHEET AND CONDUCTIVE SHEET FUJIFILM CORPORATION (JP) 2015-08-20 — — US disclosed
US-20150234271-A1 MANUFACTURING METHOD OF CONDUCTIVE SHEET AND CONDUCTIVE SHEET FUJIFILM CORPORATION (JP) 2015-08-20 — — US disclosed
US-20140267954-A1 TRANSPARENT ELECTRODE SHEET, METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE SHEET, AND CAPACITIVE TOUCH PANEL USING SUCH TRANSPARENT ELECTRODE SHEET FUJIFILM CORPORATION (JP) 2014-09-18 — — US disclosed
US-20140267954-A1 TRANSPARENT ELECTRODE SHEET, METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE SHEET, AND CAPACITIVE TOUCH PANEL USING SUCH TRANSPARENT ELECTRODE SHEET FUJIFILM CORPORATION (JP) 2014-09-18 — — US disclosed
US-20130299216-A1 TRANSPARENT ELECTRODE SHEET, METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE SHEET, AND CAPACITIVE TOUCH PANEL USING SUCH TRANSPARENT ELECTRODE SHEET FUJIFLIM CORPORATION (JP) 2013-11-14 — — US disclosed
US-20130299216-A1 TRANSPARENT ELECTRODE SHEET, METHOD FOR MANUFACTURING TRANSPARENT ELECTRODE SHEET, AND CAPACITIVE TOUCH PANEL USING SUCH TRANSPARENT ELECTRODE SHEET FUJIFLIM CORPORATION (JP) 2013-11-14 — — US disclosed
US-20070020566-A1 Photothermographic material and image forming method FUJI PHOTO FILM., LTD. 2007-01-25 — — US disclosed
US-7166408-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-01-23 — — US disclosed
US-7166408-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-01-23 — — US disclosed
US-20070003885-A1 Black and white photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
US-20070003885-A1 Black and white photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2007-01-04 — — US disclosed
EP-1220022-B1 Silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 2006-11-29 — — EP disclosed
EP-1445649-A1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJI PHOTO FILM CO., LTD. (JP) 2004-08-11 — — EP disclosed
EP-1403698-A1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJI PHOTO FILM CO., LTD. (JP) 2004-03-31 — — EP disclosed
US-6544718-B2 Hydrophilic colloid layer includes a disulfide or dimercapto compound of given formula; for photomechanical plate-making that exhibits ultrahigh-contrast photographic characteristics FUJI PHOTO FILM CO., LTD. (JP) 2003-04-08 — — US disclosed
EP-1217432-A2 Silver halide photographic light-sensitive material and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 2002-06-26 — — EP disclosed
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