⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1226137 | 1.00 | — | — | |
| SCHEMBL400244 | 1.00 | — | — | |
| SCHEMBL12272287 | 1.00 | — | — | |
| SCHEMBL1226953 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL27779801 | 0.95 | — | — | |
| SCHEMBL28295899 | 0.95 | — | — | |
| SCHEMBL27576289 | 0.95 | — | — | |
| SCHEMBL28218386 | 0.95 | — | — | |
| SCHEMBL31243568 | 0.95 | — | — | |
| SCHEMBL27949066 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9343293-B2 | Flowable silicon—carbon—oxygen layers for semiconductor processing | APPLIED MATERIALS, INC. (US) | 2016-05-17 | — | — | US | claimed |
| US-20140302688-A1 | FLOWABLE SILICON-CARBON-OXYGEN LAYERS FOR SEMICONDUCTOR PROCESSING | APPLIED MATERIALS, INC. (US) | 2014-10-09 | — | — | US | claimed |
| US-20130217239-A1 | FLOWABLE SILICON-AND-CARBON-CONTAINING LAYERS FOR SEMICONDUCTOR PROCESSING | APPLIED MATERIALS, INC. (US) | 2013-08-22 | — | — | US | claimed |
| US-20130217240-A1 | FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING | APPLIED MATERIALS, INC. (US) | 2013-08-22 | — | — | US | claimed |
| WO-2013036667-A2 | FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING | APPLIED MATERIALS, INC. (US) | 2013-03-14 | — | — | WO | claimed |
| US-8101236-B2 | Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-24 | — | — | US | claimed |
| US-20090181178-A1 | SiCOH DIELECTRIC MATERIAL WITH IMPROVED TOUGHNESS AND IMPROVED Si-C BONDING, SEMICONDUCTOR DEVICE CONTAINING THE SAME, AND METHOD TO MAKE THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | claimed |
| US-20060165891-A1 | SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-07-27 | — | — | US | claimed |
| EP-4746858-A2 | COATED NANOPARTICLES AND THEIR USE FOR DELIVERY OF THERAPEUTIC AND DIAGNOSTIC AGENTS | Politecnico Di Torino (IT) | 2026-05-27 | — | — | EP | disclosed |
| EP-3880756-B1 | METALLIC BISMUTH PIGMENTS | SUN CHEMICAL CORP (US) | 2025-12-24 | — | — | EP | disclosed |
| US-12486448-B2 | Perovskite compound-based electroluminescent layer and light emitting device comprising same | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2025-12-02 | — | — | US | disclosed |
| US-12378495-B2 | Tribotechnical compositions from self-assembled carbon nanoarchitectonics, and applications thereof | P & S GLOBAL HOLDINGS LLC (US) | 2025-08-05 | — | — | US | disclosed |
| US-20250215174-A1 | Hydrophobic Coatings on Glass Having Superior Properties and Methods of Coating Using Atomic or Molecular Deposition | ALD NANOSOLUTIONS, INC. | 2025-07-03 | — | — | US | disclosed |
| WO-2025021705-A2 | COATED NANOPARTICLES AND THEIR USE FOR DELIVERY OF THERAPEUTIC AND DIAGNOSTIC AGENTS | POLITECNICO DI TORINO (IT) | 2025-01-30 | — | — | WO | disclosed |
| US-7504457-B2 | Functionalized polymers and improved tires therefrom | BRIDGESTONE CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-7479306-B2 | SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-20 | — | — | US | disclosed |
| EP-1836238-A1 | FUNCTIONALIZED POLYMERS AND IMPROVED TIRES THEREFROM | Bridgestone Corporation (JP) | 2007-09-26 | — | — | EP | disclosed |
| US-20060173138-A1 | particularly tire treads exhibiting reduced rolling resistance; include a primary or secondary amine group and a silicon-containing or tin-containing group at or near at least one end of a polymer chain | BRIDGESTONE CORPORATION (JP) | 2006-08-03 | — | — | US | disclosed |
| US-20060165891-A1 | SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-07-27 | — | — | US | disclosed |
| WO-2006076629-A1 | FUNCTIONALIZED POLYMERS AND IMPROVED TIRES THEREFROM | BRIDGESTONE CORPORATION (JP) | 2006-07-20 | — | — | WO | disclosed |