⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4022789 | 0.73 | — | — | |
| SCHEMBL2254980 | 0.69 | — | — | |
| SCHEMBL4028209 | 0.60 | — | — | |
| SCHEMBL27747854 | 0.59 | — | — | |
| SCHEMBL2100119 | 0.56 | — | — | |
| SCHEMBL2100376 | 0.56 | — | — | |
| SCHEMBL2102685 | 0.56 | — | — | |
| SCHEMBL3797509 | 0.56 | — | — | |
| SCHEMBL51749 | 0.55 | — | — | |
| SCHEMBL1904241 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070004931-A1 | Precursors for depositing silicon containing films | VERSUM MATERIALS US, LLC | 2007-01-04 | — | — | US | claimed |
| WO-2005121399-A1 | PRECURSORS FOR DEPOSITION OF SILICON NITRIDE, SILICON OXYNITRIDE AND METAL SILICON OXYNITRIDES | EPICHEM LIMITED (GB) | 2005-12-22 | — | — | WO | claimed |
| US-7488690-B2 | Silicon nitride film with stress control | APPLIED MATERIALS, INC. (US) | 2009-02-10 | — | — | US | disclosed |
| US-7288145-B2 | Precursors for depositing silicon containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-10-30 | — | — | US | disclosed |
| US-20070004931-A1 | Precursors for depositing silicon containing films | VERSUM MATERIALS US, LLC | 2007-01-04 | — | — | US | disclosed |
| US-7122222-B2 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-10-17 | — | — | US | disclosed |
| WO-2006014471-A1 | SILICON NITRIDE FILM WITH STRESS CONTROL | APPLIED MATERIALS, INC. (US) | 2006-02-09 | — | — | WO | disclosed |
| US-20060009041-A1 | Silicon nitride film with stress control | APPLIED MATERIALS, INC. | 2006-01-12 | — | — | US | disclosed |
| WO-2005121399-A1 | PRECURSORS FOR DEPOSITION OF SILICON NITRIDE, SILICON OXYNITRIDE AND METAL SILICON OXYNITRIDES | EPICHEM LIMITED (GB) | 2005-12-22 | — | — | WO | disclosed |
| US-20040146644-A1 | Precursors for depositing silicon containing films and processes thereof | VERSUM MATERIALS US, LLC | 2004-07-29 | — | — | US | disclosed |
| EP-1441042-A1 | Precursors for depositing silicon containing films and processes thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-07-28 | — | — | EP | disclosed |