Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | AHR | P35869 | 2/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | CCR1 | P32246 | 1/20 | 0.30 |
| ▸ | CCR5 | P51681 | 1/20 | 0.30 |
| ▸ | CCR8 | P51685 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27827268 | 0.81 | SMN1; SMN2 (0.42) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL6973049 | 0.77 | SMN1; SMN2 (0.45) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL3203997 | 0.74 | — | — | |
| SCHEMBL329680 | 0.72 | SMN1; SMN2 (0.41) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL3929046 | 0.72 | SMN1; SMN2 (0.38) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL27967623 | 0.72 | MAPK1 (0.37) | GAATSHRKDM4ELMNA | |
| SCHEMBL17976467 | 0.71 | SMN1; SMN2 (0.52) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL3150669 | 0.70 | SMN1; SMN2 (0.42) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| SCHEMBL12934595 | 0.70 | SMN1; SMN2 (0.50) | SMN1; SMN2L3MBTL1AHRCHRM2GAA | |
| Ammonia Solution, Strong SCHEMBL27641252 | 0.70 | SMN1; SMN2 (0.50) | SMN1; SMN2L3MBTL1AHRCHRM2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10759119-B2 | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORPORATION (JP) | 2020-09-01 | — | — | US | disclosed |
| US-20190054704-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-10137637-B2 | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORPORATION (JP) | 2018-11-27 | — | — | US | disclosed |
| EP-2738229-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-04-18 | — | — | EP | disclosed |
| EP-2738228-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-9771489-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-09-26 | — | — | US | disclosed |
| US-9732204-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9725611-B2 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORPORATION (JP) | 2017-08-08 | — | — | US | disclosed |
| EP-2738227-B1 | Ultraviolet ray curable ink composition for use in ink jet method and printed object | SEIKO EPSON CORP (JP) | 2015-10-21 | — | — | EP | disclosed |
| US-20150239175-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20120295076-A1 | ULTRAVIOLET RAY CURABLE INK JET COMPOSITION AND PRINTED OBJECT | SEIKO EPSON CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2017369-A1 | Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates | University of Massachusetts (US) | 2009-01-21 | — | — | EP | disclosed |
| US-6992018-B2 | Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates | UNIVERSITY OF MASSACHUSETTS (US) | 2006-01-31 | — | — | US | disclosed |
| US-20040229023-A1 | Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates | UNIVERSITY OF MASSACHUSETTS, A MASSACHUSETTS CORPORATION | 2004-11-18 | — | — | US | disclosed |
| US-6773844-B2 | HIGH PERFORMANCE WITH A HIGH REACTIVITY | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-08-10 | — | — | US | disclosed |
| US-6689700-B1 | Chemical fluid deposition method for the formation of metal and metal alloy films on patterned and unpatterned substrates | UNIVERSITY OF MASSACHUSETTS | 2004-02-10 | — | — | US | disclosed |
| EP-1234063-A2 | CHEMICAL FLUID DEPOSITION FOR THE FORMATION OF METAL AND METAL ALLOY FILMS ON PATTERNED AND UNPATTERNED SUBSTRATES | University of Massachusetts (US) | 2002-08-28 | — | — | EP | disclosed |
| WO-2001032951-A9 | CHEMICAL FLUID DEPOSITION FOR THE FORMATION OF METAL AND METAL ALLOY FILMS ON PATTERNED AND UNPATTERNED SUBSTRATES | UNIV MASSACHUSETTS (US) | 2002-05-30 | — | — | WO | disclosed |
| US-20020061432-A1 | Proton conductive film and fuel cell using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-05-23 | — | — | US | disclosed |
| WO-2001032951-A2 | CHEMICAL FLUID DEPOSITION FOR THE FORMATION OF METAL AND METAL ALLOY FILMS ON PATTERNED AND UNPATTERNED SUBSTRATES | UNIVERSITY OF MASSACHUSETTS (US) | 2001-05-10 | — | — | WO | disclosed |