⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8826752 | 0.75 | — | — | |
| SCHEMBL4389530 | 0.72 | — | — | |
| SCHEMBL15341 | 0.72 | — | — | |
| SCHEMBL28222281 | 0.67 | — | — | |
| SCHEMBL28152283 | 0.67 | — | — | |
| SCHEMBL49955 | 0.63 | — | — | |
| SCHEMBL23829797 | 0.62 | — | — | |
| SCHEMBL59794 | 0.62 | — | — | |
| SCHEMBL679256 | 0.62 | — | — | |
| SCHEMBL1498110 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109346769-B | Additive for reducing water content and acidity in electrolyte | 合肥国轩高科动力能源有限公司 | 2020-05-22 | — | — | CN | claimed |
| EP-3323505-B1 | HYDROSILYLATION REACTION CATALYST | UNIV KYUSHU NAT UNIV CORP (JP) | 2024-07-17 | — | — | EP | disclosed |
| US-20240191078-A1 | ULTRAVIOLET-RAY-CURABLE COMPOSITION AND USE THEREOF | DOW TORAY CO LTD (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240191017-A1 | ULTRAVIOLET-CURABLE COMPOSITION AND USE THEREOF | DOW TORAY CO LTD (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240174889-A1 | ULTRAVIOLET-CURABLE COMPOSITION AND USE THEREOF | DOW TORAY CO LTD (JP) | 2024-05-30 | — | — | US | disclosed |
| WO-2024106213-A1 | METHOD FOR PRODUCING DISILOXANE COMPOUND | 信越化学工業株式会社 | 2024-05-23 | — | — | WO | disclosed |
| CN-117897421-A | High-energy ray-curable composition and use thereof | 陶氏东丽株式会社 | 2024-04-16 | — | — | CN | disclosed |
| WO-2024071133-A1 | UV-CURABLE COMPOSITION AND USE THEREOF | ダウ・東レ株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-114616299-B | Ultraviolet curable polyorganosiloxane composition and use thereof | 陶氏东丽株式会社 | 2024-02-27 | — | — | CN | disclosed |
| CN-117242107-A | Ultraviolet curable composition and use thereof | 陶氏东丽株式会社 | 2023-12-15 | — | — | CN | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1930338-A1 | Fumaric acid derivates and ophtalmic lenses using the same | E-brain Corporation Ltd. (JP) | 2008-06-11 | — | — | EP | disclosed |
| US-20080132666-A1 | Fumaric Acid Derivatives and Ophthalmic Lenses Using the Same | MENICON NECT CO., LTD. (JP) | 2008-06-05 | — | — | US | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-5698169-A | USING DICARBOLLIDE OR DICARBAEXTRANIDE COMPLEX; ION EXCHANGING | COREMETALS RESEARCH, INC. (US) | 1997-12-16 | — | — | US | disclosed |
| US-5666642-A | DICARBOLIDES | COREMETALS RESEARCH, INC. (US) | 1997-09-09 | — | — | US | disclosed |