SCHEMBL4034262

SCHEMBL4034262

CC12CC3CC(O)(C1)CC(CO)(C3)C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
GRIN1 Q05586 6/20 0.46
GRIN2A Q12879 6/20 0.46
GRIN2D O15399 5/20 0.46
GRIN3B O60391 5/20 0.46
GRIN2B Q13224 5/20 0.46
GRIN2C Q14957 5/20 0.46
GRIN3A Q8TCU5 5/20 0.46
HTT P42858 2/20 0.38
LMNA P02545 2/20 0.35
SLC22A1 O15245 1/20 0.35
ESR1 P03372 1/20 0.35
ADRB3 P13945 1/20 0.35
ACHE P22303 1/20 0.35
OPRK1 P41145 1/20 0.35
MTOR P42345 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4044998 0.86 MEN1 (0.55) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL3160856 0.86 MEN1 (0.61) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL6905016 0.85 MEN1 (0.47) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL5607828 0.84 GRIN2D (0.34) GRIN1GRIN2AGRIN2DGRIN3BGRIN2B
SCHEMBL25472233 0.80 GRIN1 (0.52) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL733948 0.80 GRIN1 (0.52) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL986905 0.80 GRIN1 (0.46) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL5508439 0.76 GRIN1 (0.62) MEN1KMT2AGRIN1GRIN2AGRIN2D
SCHEMBL4041497 0.76 MEN1 (0.46) MEN1KMT2AGRIN1GRIN2AGRIN2D
Hydrochloric Acid SCHEMBL28455443 0.75 GRIN1 (0.63) MEN1KMT2AGRIN1GRIN2AGRIN2D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681222-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2023-06-20 US disclosed
US-20220137508-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2022-05-05 US disclosed
US-20210278764-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2021-09-09 US disclosed
US-11036133-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2021-06-15 US disclosed
US-20200124961-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2020-04-23 US disclosed
US-10620534-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2020-04-14 US disclosed
US-20190278175-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2019-09-12 US disclosed
US-20190025695-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2019-01-24 US disclosed
US-10082733-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2018-09-25 US disclosed
EP-2003148-B1 RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER JSR CORP (JP) 2017-07-19 EP disclosed
US-20170199453-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-07-13 US disclosed
EP-2003148-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2009-04-22 EP disclosed
EP-2003148-A2 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-12-17 EP disclosed
US-RE39744-E1 Adamantane derivatives and process for producing them DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-07-24 US disclosed
EP-1602975-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-12-07 EP disclosed
US-6392104-B1 CHEMICAL INTERMEDIATES FOR DRUGS, AGRICULTURE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-05-21 US disclosed
EP-0927711-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM Daicel Chemical Industries, Ltd. (JP) 1999-07-07 EP disclosed