SCHEMBL4037693

SCHEMBL4037693

F/C=C(/F)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9706654 1.00
SCHEMBL2549362 1.00
SCHEMBL4820306 0.74
SCHEMBL6965519 0.70
SCHEMBL4820320 0.70
SCHEMBL4820317 0.70
SCHEMBL27710433 0.67
SCHEMBL20207 0.67
SCHEMBL6965514 0.67
SCHEMBL6965510 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2009019219-A2 METHODS OF USING A SOLVENT OR A FOAM BLOWING AGENT Solvay (Société Anonyme) (BE) 2009-02-12 WO claimed
US-7462480-B2 Stimulation of microbial dechlorination of polychorinated biphenyls with halogenated ethenes UNIVERSITY OF MARYLAND BIOTECHNOLOGY INSTITUTE (US) 2008-12-09 US claimed
US-20060057705-A1 Stimulation of microbial dechlorination of polychlorinated biphenyls with halogenated ethenes UNIVERSITY OF MARYLAND BALTIMORE COUNTY 2006-03-16 US claimed
EP-3563406-B1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AIR LIQUIDE (FR) 2024-04-24 EP disclosed
CN-116884838-A Iodine-containing compounds for etching semiconductor structures 乔治洛德方法研究和开发液化空气有限公司 2023-10-13 CN disclosed
CN-110178206-B Iodine-containing compounds for etching semiconductor structures 乔治洛德方法研究和开发液化空气有限公司 2023-08-18 CN disclosed
CN-111655659-B Method for producing compound having butadiene skeleton containing hydrogen and fluorine and/or chlorine 关东电化工业株式会社 2023-03-28 CN disclosed
US-11430663-B2 Iodine-containing compounds for etching semiconductor structures AMERICAN AIR LIQUIDE, INC. (US) 2022-08-30 US disclosed
US-11319324-B2 Pyrazolo-pyrrolo-pyrimidine-dione derivatives as P2X3 inhibitors BAYER AKTIENGESELLSCHAFT (DE) 2022-05-03 US disclosed
EP-3700907-B1 NOVEL PYRAZOLO-PYRROLO-PYRIMIDINE-DIONE DERIVATIVES AS P2X3 INHIBITORS BAYER AG (DE) 2022-03-09 EP disclosed
US-20210317128-A1 NOVEL PYRAZOLO-PYRROLO-PYRIMIDINE-DIONE DERIVATIVES AS P2X3 INHIBITORS BAYER AKTIENGESELLSCHAFT (DE) 2021-10-14 US disclosed
WO-2017106771-A1 PYRROLOPYRIMIDINE COMPOUNDS, USE AS INHIBITORS OF THE KINASE LRRK2, AND METHODS FOR PREPARATION THEREOF SOUTHERN RESEARCH INSTITUTE (US) 2017-06-22 WO disclosed
US-20170178923-A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AMERICAN AIR LIQUIDE, INC. 2017-06-22 US disclosed
US-20170178923-A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES AMERICAN AIR LIQUIDE, INC. 2017-06-22 US disclosed
US-20170174694-A1 PYRROLOPYRIMIDINE COMPOUNDS, USE AS INHIBITORS OF THE KINASE LRRK2, AND METHODS FOR PREPARATION THEREOF SOUTHERN RESEARCH INSTITUTE 2017-06-22 US disclosed
US-20160158220-A1 BENZOQUINOLINE INHIBITORS OF VESICULAR MONOAMINE TRANSPORTER 2 AUSPEX PHARMACUTICALS, INC. 2016-06-09 US disclosed
WO-2009019219-A2 METHODS OF USING A SOLVENT OR A FOAM BLOWING AGENT Solvay (Société Anonyme) (BE) 2009-02-12 WO disclosed
US-7462480-B2 Stimulation of microbial dechlorination of polychorinated biphenyls with halogenated ethenes UNIVERSITY OF MARYLAND BIOTECHNOLOGY INSTITUTE (US) 2008-12-09 US disclosed
US-20060057705-A1 Stimulation of microbial dechlorination of polychlorinated biphenyls with halogenated ethenes UNIVERSITY OF MARYLAND BALTIMORE COUNTY 2006-03-16 US disclosed
WO-2003065011-A2 STIMULATION OF MICROBIAL DECHLORINATION OF POLYCHLORINATED BIPHENYLS WITH HALOGENATED ETHENES UNIVERSITY OF MARYLAND BIOTECHNOLOGY INSTITUTE (US) 2003-08-07 WO disclosed