⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4037693 | 1.00 | — | — | |
| SCHEMBL2549362 | 1.00 | — | — | |
| SCHEMBL4820306 | 0.74 | — | — | |
| SCHEMBL6965519 | 0.70 | — | — | |
| SCHEMBL4820320 | 0.70 | — | — | |
| SCHEMBL4820317 | 0.70 | — | — | |
| SCHEMBL27710433 | 0.67 | — | — | |
| SCHEMBL20207 | 0.67 | — | — | |
| SCHEMBL6965514 | 0.67 | — | — | |
| SCHEMBL6965510 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3563406-B1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE (FR) | 2024-04-24 | — | — | EP | disclosed |
| CN-116884838-A | Iodine-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-110178206-B | Iodine-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2023-08-18 | — | — | CN | disclosed |
| US-11430663-B2 | Iodine-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2022-08-30 | — | — | US | disclosed |
| US-11279778-B2 | Polydifluoroacetylene, method for producing polydifluoroacetylene, precursor polymer, molded article and powder | DAIKIN INDUSTRIES. LTD. (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20200203174-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE AMERICAN (US) | 2020-06-25 | — | — | US | disclosed |
| US-20200203174-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE AMERICAN (US) | 2020-06-25 | — | — | US | disclosed |
| US-10607850-B2 | Iodine-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2020-03-31 | — | — | US | disclosed |
| US-10607850-B2 | Iodine-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2020-03-31 | — | — | US | disclosed |
| EP-3563406-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2019-11-06 | — | — | EP | disclosed |
| US-20170178923-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AMERICAN AIR LIQUIDE, INC. | 2017-06-22 | — | — | US | disclosed |
| US-20170178923-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AMERICAN AIR LIQUIDE, INC. | 2017-06-22 | — | — | US | disclosed |
| US-20170178923-A1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AMERICAN AIR LIQUIDE, INC. | 2017-06-22 | — | — | US | disclosed |
| US-5151492-A | Fluorine containing homopolymers or copolymers | NIPPON MEKTRON, LIMITED (JP) | 1992-09-29 | — | — | US | disclosed |
| WO-1991009001-A1 | 1,1,2-TRIFLUORO-6-IODO-1-HEXENE, 1,1,2-TRIFLUORO-1,5-HEXADIENE, AND PROCESSES THEREFOR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-06-27 | — | — | WO | disclosed |
| US-5015790-A | 1,1,2-trifluoro-6-iodo-1-hexene, 1,1,2-trifluoro-1,5-hexadiene, and processes therefore | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-05-14 | — | — | US | disclosed |
| EP-0171290-A2 | Improved fluoropolymer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-02-12 | — | — | EP | disclosed |
| US-4058578-A | DISPERSION | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-11-15 | — | — | US | disclosed |