Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR1 | Q92633 | 7/20 | 0.36 |
| ▸ | LPAR3 | Q9UBY5 | 7/20 | 0.36 |
| ▸ | LPAR6 | P43657 | 5/20 | 0.36 |
| ▸ | LPAR4 | Q99677 | 5/20 | 0.36 |
| ▸ | LPAR5 | Q9H1C0 | 5/20 | 0.36 |
| ▸ | LPAR2 | Q9HBW0 | 5/20 | 0.36 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.34 |
| ▸ | PRKCG | P05129 | 1/20 | 0.34 |
| ▸ | PRKCB | P05771 | 1/20 | 0.34 |
| ▸ | PRKCA | P17252 | 1/20 | 0.34 |
| ▸ | PRKCH | P24723 | 1/20 | 0.34 |
| ▸ | PRKCI | P41743 | 1/20 | 0.34 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.34 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.34 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.34 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.34 |
| ▸ | PRKD1 | Q15139 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4629518 | 0.78 | LMNA (0.32) | — | |
| SCHEMBL29091175 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL6238542 | 0.77 | USP2 (0.42) | — | |
| Alcohol SCHEMBL29086643 | 0.76 | — | — | |
| SCHEMBL4547626 | 0.75 | PRKD3 (0.37) | LPAR1LPAR3LPAR6LPAR4LPAR5 | |
| SCHEMBL27607404 | 0.75 | LMNA (0.38) | LPAR1LPAR3LPAR6LPAR4LPAR5 | |
| SCHEMBL28920707 | 0.74 | LMNA (0.31) | — | |
| SCHEMBL28641894 | 0.74 | LMNA (0.41) | LPAR1LPAR3LPAR6LPAR4LPAR5 | |
| SCHEMBL3882456 | 0.72 | LPAR1 (0.44) | LPAR1LPAR3LPAR6LPAR4LPAR5 | |
| SCHEMBL28663011 | 0.70 | LMNA (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7514202-B2 | Thermal acid generator, resist undercoat material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20070264596-A1 | Thermal acid generator, resist undercoat material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20050277058-A1 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |