Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29785220 | 0.86 | USP2 (0.31) | — | |
| SCHEMBL12910768 | 0.83 | FDPS (0.31) | — | |
| SCHEMBL11654394 | 0.81 | CYP2D6 (0.31) | — | |
| SCHEMBL3885660 | 0.78 | TSHR (0.47) | TSHR | |
| SCHEMBL29093233 | 0.78 | TSHR (0.47) | TSHR | |
| SCHEMBL428320 | 0.78 | TSHR (0.47) | TSHR | |
| SCHEMBL619867 | 0.78 | TSHR (0.47) | TSHR | |
| SCHEMBL29093054 | 0.78 | TSHR (0.47) | TSHR | |
| SCHEMBL235075 | 0.76 | — | — | |
| SCHEMBL15283773 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250051493-A1 | PRODUCTION METHOD FOR PRODUCING REACTIVE SILICON GROUP-CONTAINING ORGANIC POLYMER | AGC Inc. (JP) | 2025-02-13 | — | — | US | disclosed |
| WO-2024141355-A1 | ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE | MERCK PATENT GMBH (DE) | 2024-07-04 | — | — | WO | disclosed |
| EP-1627259-A4 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PROD & CHEM (US) | 2009-04-01 | — | — | EP | disclosed |
| US-20090081592-A1 | FOUNTAIN SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING AND HEAT-SET OFFSET ROTARY PRINTING PROCESS | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| EP-1627259-A1 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-02-22 | — | — | EP | disclosed |
| WO-2004107056-A1 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-09 | — | — | WO | disclosed |