⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10489315 | 0.90 | CA1 (0.30) | — | |
| SCHEMBL197084 | 0.90 | CA1 (0.33) | — | |
| SCHEMBL3411655 | 0.87 | LTA4H (0.33) | — | |
| SCHEMBL27207778 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL5107617 | 0.85 | CA1 (0.30) | — | |
| SCHEMBL197099 | 0.85 | CA1 (0.33) | — | |
| SCHEMBL1398394 | 0.82 | CA1 (0.32) | — | |
| Hydrochloric Acid SCHEMBL7165412 | 0.82 | CA1 (0.32) | — | |
| Hydrochloric Acid SCHEMBL7165413 | 0.82 | CA1 (0.32) | — | |
| SCHEMBL7769634 | 0.82 | CA1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |