SCHEMBL4060951

SCHEMBL4060951

CC(C)(C)C(=O)OC(=O)C(=O)C(C)(C)C.[SrH2]

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8346360 1.00 ELANE (0.32) ELANE
SCHEMBL6895243 1.00 ELANE (0.32) ELANE
SCHEMBL8025454 0.97 ELANE (0.31) ELANE
SCHEMBL1725969 0.97 ELANE (0.33) ELANE
SCHEMBL2387294 0.95 ELANE (0.32) ELANE
SCHEMBL5151400 0.95 ELANE (0.32) ELANE
SCHEMBL4213128 0.95 ELANE (0.32) ELANE
SCHEMBL5451160 0.95 ELANE (0.32) ELANE
SCHEMBL4622920 0.95 ELANE (0.32) ELANE
SCHEMBL15818033 0.95 ELANE (0.32) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150059818-A1 METHOD OF PRODUCING FILM OF SURFACE Nb-CONTAINING La-STO CUBIC CRYSTAL PARTICLES NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (JP) 2015-03-05 US disclosed
EP-2055804-A1 Method for preparing a deposition from a vapour Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO (NL) 2009-05-06 EP disclosed
US-7259058-B2 Fabricating method of semiconductor integrated circuits RENESAS TECHONOLOGY CORP. (JP) 2007-08-21 US disclosed
US-20060219294-A1 Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same DAI NIPPON PRINTING CO., LTD. 2006-10-05 US disclosed
US-20050183769-A1 Method of producing substrate for dye-sensitized solar cell and dye-sensitized solar cell DAI NIPPON PRINTING CO., LTD. (JP) 2005-08-25 US disclosed
EP-1449241-A1 LANTHANIDE SERIES LAYERED SUPERLATTICE MATERIALS FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 2004-08-25 EP disclosed
US-6706585-B2 Chemical vapor deposition process for fabricating layered superlattice materials SYMETRIX CORPORATION 2004-03-16 US disclosed
US-20030203513-A1 Chemical vapor deposition process for fabricating layered superlattice materials SYMETRIX CORPORATION (US) 2003-10-30 US disclosed
WO-2003049172-A1 LANTHANIDE SERIES LAYERED SUPERLATTICE MATERIALS FOR INTEGRATED CIRCUIT APPLICATIONS SYMETRIX CORPORATION (US) 2003-06-12 WO disclosed
US-6562678-B1 Chemical vapor deposition process for fabricating layered superlattice materials SYMETRIX CORPORATION 2003-05-13 US disclosed
US-20020102826-A1 Fabricating method of semiconductor integrated circuits RENESAS ELECTRONICS CORPORATION (JP) 2002-08-01 US disclosed
EP-0708983-B1 CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS SYMETRIX CORP (US) 2001-09-26 EP disclosed
WO-2001066834-A2 CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS SYMETRIX CORPORATION (US) 2001-09-13 WO disclosed
EP-0998594-A1 METHOD AND APPARATUS FOR FABRICATION OF THIN FILMS BY CHEMICAL VAPOR DEPOSITION SYMETRIX CORPORATION (US) 2000-05-10 EP disclosed
WO-1999002756-A1 METHOD AND APPARATUS FOR FABRICATION OF THIN FILMS BY CHEMICAL VAPOR DEPOSITION SYMETRIX CORPORATION (US) 1999-01-21 WO disclosed
EP-0708983-A1 CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS Semetrix Corporation (US) 1996-05-01 EP disclosed
WO-1995002897-A1 CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS SYMETRIX CORPORATION (US) 1995-01-26 WO disclosed
US-4916828-A Method of producing saturated vapor of solid metal organic compounds in the metal organic chemical vapor deposition method TOSOH AKZO CORPORATION (JP) 1990-04-17 US disclosed