SCHEMBL4070129

SCHEMBL4070129

O=S(=O)(O)c1ccc(O)c(S(=O)(=O)O)c1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
COMT P21964 1/20 0.42
NQO1 P15559 1/20 0.39
HSD17B10 Q99714 3/20 0.38
LMNA P02545 2/20 0.38
HPGD P15428 2/20 0.38
HIF1A Q16665 1/20 0.38
AURKA O14965 1/20 0.38
AURKB Q96GD4 1/20 0.38
TNNI3 P19429 1/20 0.37
TNNT2 P45379 1/20 0.37
TNNC1 P63316 1/20 0.37
HKDC1 Q2TB90 1/20 0.37
ALDH1A1 P00352 2/20 0.36
LDHA P00338 1/20 0.36
CYP2D6 P10635 1/20 0.36
PGAM1 P18669 1/20 0.34
MPL P40238 3/20 0.34
CYP1A2 P05177 1/20 0.34
CTRB1 P17538 1/20 0.33
DAPK1 P53355 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7756811 0.98 COMT (0.41) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL7536401 0.88 CYP2D6 (0.39) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL28873753 0.87 LDHA (0.47) COMTNQO1HSD17B10AURKAAURKB
SCHEMBL8740780 0.86 COMT (0.44) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL31256 0.84 COMT (0.43) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL29373188 0.84 COMT (0.43) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL2552952 0.83 HSD17B10 (0.40) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL3218328 0.82 COMT (0.42) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL669153 0.81 COMT (0.44) COMTNQO1HSD17B10LMNAHPGD
SCHEMBL29373949 0.81 COMT (0.44) COMTNQO1HSD17B10LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108550884-A A kind of flow battery 西南交通大学 2018-09-18 CN claimed
EP-1081186-A1 Stabilized aqueous acrylamide polymer composition and photographic element containing the composition EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 2001-03-07 EP claimed
EP-0839320-A1 METHOD FOR QUANTITATIVE MEASUREMENT OF AN ENZYME LINKED IMMUNOSORBENT ASSAY BRF INTERNATIONAL (GB) 1998-05-06 EP claimed
WO-1997001762-A1 METHOD FOR QUANTITATIVE MEASUREMENT OF AN ENZYME LINKED IMMUNOSORBENT ASSAY BRF INTERNATIONAL (GB) 1997-01-16 WO claimed
EP-0605694-B1 PROCESS FOR PRODUCING CERAMIC GREEN BODIES GAUCKLER LUDWIG J (CH) 1996-03-27 EP claimed
EP-0605694-A1 PROCESS FOR PRODUCING CERAMIC GREEN BODIES. GAUCKLER LUDWIG J (CH) 1994-07-13 EP claimed
WO-1994002429-A1 PROCESS FOR PRODUCING CERAMIC GREEN BODIES GAUCKLER LUDWIG J (CH) 1994-02-03 WO claimed
EP-0257635-B1 PERMEABLE, POROUS, POLYMERIC MEMBRANE WITH HYDROPHILIC CHARACTER, METHODS FOR PREPARING SAID MEMBRANES, AND THEIR USE DOW DANMARK A/S (DK) 1993-03-03 EP claimed
EP-0257635-A2 Permeable, porous, polymeric membrane with hydrophilic character, methods for preparing said membranes, and their use DOW DANMARK A/S (DK) 1988-03-02 EP claimed
US-4329422-A TO DESENSITILE OR DEVELOP LITHOGRAPHIC PRINTING PLATES NAPP SYSTEMS (USA), INC. (US) 1982-05-11 US claimed
CN-108550884-A A kind of flow battery 西南交通大学 2018-09-18 CN disclosed
CN-101275065-B Lapping liquid FUJI PHOTO FILM CO LTD 2013-07-31 CN disclosed
US-7524989-B2 Stabilized hydroxylamine solutions BASF AKTIENGESELLSCHAFT (DE) 2009-04-28 US disclosed
CN-101275065-A Lapping liquid FUJI FILM CORP (JP) 2008-10-01 CN disclosed
CN-101041769-A Metal polishing slurry FUJIFILM CORP (JP) 2007-09-26 CN disclosed
US-4395302-A Metal dissolution process using H2 O2 --H2 SO4 etchant ENTHONE INCORPORATED (US) 1983-07-26 US disclosed
US-4329422-A TO DESENSITILE OR DEVELOP LITHOGRAPHIC PRINTING PLATES NAPP SYSTEMS (USA), INC. (US) 1982-05-11 US disclosed
EP-0009031-A4 DESENSITIZING SOLUTION AND PROCESS FOR TREATING A DIAZO PHOTOSENSITIVE PRINTING PLATE. NAPP SYSTEMS INC (US) 1981-08-28 EP disclosed
EP-0009031-A1 DESENSITIZING SOLUTION AND PROCESS FOR TREATING A DIAZO PHOTOSENSITIVE PRINTING PLATE. NAPP SYSTEMS INC (US) 1980-03-19 EP disclosed
WO-1979000593-A1 DESENSITIZING SOLUTION AND PROCESS FOR TREATING A DIAZO PHOTOSENSITIVE PRINTING PLATE NAPP SYSTEMS INC (US) 1979-08-23 WO disclosed