SCHEMBL40728

SCHEMBL40728

CC=CCC(CC(=O)O)C(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 5/20 0.58
GRIK2 Q13002 5/20 0.58
FOLH1 Q04609 4/20 0.50
CPA1 P15085 2/20 0.38
CPB1 P15086 1/20 0.38
CPA3 P15088 1/20 0.38
CPB2 Q96IY4 1/20 0.38
TDP1 Q9NUW8 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
CTSK P43235 2/20 0.35
CHRM1 P11229 1/20 0.34
AKR1A1 P14550 1/20 0.34
CHRM3 P20309 1/20 0.34
HTR2A P28223 1/20 0.34
HTR2C P28335 1/20 0.34
ADRA1A P35348 1/20 0.34
HRH1 P35367 1/20 0.34
DRD3 P35462 1/20 0.34
SLC6A3 Q01959 1/20 0.34
HDAC1 Q13547 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13351667 1.00 GRIK1 (0.58) GRIK1GRIK2FOLH1CPA1CPB1
SCHEMBL12501647 1.00 GRIK1 (0.58) GRIK1GRIK2FOLH1CPA1CPB1
SCHEMBL26755156 0.85 GRIK1 (0.56) GRIK1GRIK2FOLH1TDP1CTSK
SCHEMBL801200 0.81 GRIK1 (0.59) GRIK1GRIK2FOLH1CPA1CPB1
SCHEMBL14385493 0.81 GRIK1 (0.59) GRIK1GRIK2FOLH1CPA1CPB1
SCHEMBL591751 0.80 GRIK1 (0.60) GRIK1GRIK2TDP1CTSKCHRM1
SCHEMBL591749 0.80 GRIK1 (0.60) GRIK1GRIK2TDP1CTSKCHRM1
SCHEMBL13302483 0.80 GRIK1 (0.60) GRIK1GRIK2TDP1CTSKCHRM1
Hydrochloric Acid SCHEMBL4148034 0.79 GRIK1 (0.46) GRIK1GRIK2FOLH1ADRA1A
SCHEMBL8815418 0.78 FOLH1 (0.45) GRIK1GRIK2FOLH1CPA1CPB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 814 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113897047-B Thermoplastic molding composition and molded article 埃姆斯化学股份公司 2025-01-03 CN claimed
EP-3929249-B1 LOW DIELECTRIC LOSS FACTOR POLYAMIDE MOLDING COMPOUND EMS CHEMIE AG (CH) 2024-10-09 EP claimed
US-12084573-B2 Polyamide molding compound with low dielectric loss factor EMS-CHEMIE AG (CH) 2024-09-10 US claimed
EP-3929250-B1 LOW DIELECTRIC LOSS FACTOR POLYAMIDE MOLDING COMPOUNDS EMS CHEMIE AG (CH) 2023-05-24 EP claimed
CN-111511837-B Impact-modified polyamide moulding materials EMS专利股份公司 2023-04-14 CN claimed
EP-3502187-B1 TOUGHENED POLYAMIDE MOULDING MASSES EMS CHEMIE AG (CH) 2022-10-05 EP claimed
CN-109423037-B Polyamide moulding materials having high gloss and high notched impact resistance EMS专利股份公司 2022-06-17 CN claimed
US-11274204-B2 Impact-modified polyamide moulding compounds EMS-PATENT AG (CH) 2022-03-15 US claimed
EP-3929249-A1 LOW DIELECTRIC LOSS FACTOR POLYAMIDE MOLDING COMPOUND EMS-CHEMIE AG (CH) 2021-12-29 EP claimed
US-20210395517-A1 POLYAMIDE MOLDING COMPOUND WITH LOW DIELECTRIC LOSS FACTOR EMS-CHEMIE AG (CH) 2021-12-23 US claimed
CN-1312838-A Complexed starch-containing compositions having high mechanical properties NOVAMONT SPA (IT) 2001-09-12 CN claimed
EP-0592018-B1 Developer for developing electrostatic images CANON KK (JP) 1998-11-11 EP claimed
US-5683845-A SMALL POLYTETRAFLUOROETHYLENE PARTICLES ON SURFACE OF TONER, POLYESTER BINDER KAO CORPORATION (JP) 1997-11-04 US claimed
EP-0460665-B1 Toner composition KAO CORP (JP) 1997-09-03 EP claimed
US-5424161-A Containing polyester resin KAO CORPORATION (JP) 1995-06-13 US claimed
EP-0592018-A2 Image forming apparatus and developer for developing electrostatic images CANON KABUSHIKI KAISHA (JP) 1994-04-13 EP claimed
EP-0460665-A1 Toner composition KAO CORPORATION (JP) 1991-12-11 EP claimed
US-5064546-A Friction modifier IDEMITSU KOSAN CO., LTD. (JP) 1991-11-12 US claimed
US-5015724-A Condensation of dialcohol with diacid to form a modified polymer as a developer for electrography KAO CORPORATION (JP) 1991-05-14 US claimed
EP-0410482-A2 Image forming apparatus CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP claimed