SCHEMBL4082689

SCHEMBL4082689

ClC[SiH2]OC(C1CCCCC1)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.33
SHBG P04278 1/20 0.33
TP53 P04637 1/20 0.31
KDM4E B2RXH2 1/20 0.30
GMNN O75496 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
BLM P54132 1/20 0.30
PMP22 Q01453 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4074028 0.78 EPHX1 (0.33) EPHX1SHBGTP53KDM4EGMNN
SCHEMBL4076752 0.78 EPHX1 (0.33) EPHX1SHBGTP53KDM4EGMNN
SCHEMBL9169425 0.75 SHBG (0.35) EPHX1SHBG
SCHEMBL9164278 0.72 SHBG (0.32) SHBG
SCHEMBL23701025 0.72 EPHX1 (0.33) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL8955071 0.72 EPHX1 (0.36) EPHX1SHBGTP53KDM4EGMNN
SCHEMBL8955947 0.72 EPHX1 (0.36) EPHX1SHBGTP53KDM4EGMNN
SCHEMBL8955267 0.72 EPHX1 (0.36) EPHX1SHBGTP53KDM4EGMNN
SCHEMBL4074041 0.71 EPHX1 (0.40) EPHX1SHBGTP53LMNA
SCHEMBL3895870 0.70 EPHX1 (0.37) EPHX1SHBGTP53KDM4EGMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed