Diethylamine

Diethylamine

SCHEMBL4083176

C1CC1.CCNCC.N

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CCKAR

The experimentally established mechanism targets of Diethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane SCHEMBL10983411 0.96 TP53 (0.73)
Diethylamine SCHEMBL27878566 0.96
Diethylamine SCHEMBL8747825 0.87
Diethylamine SCHEMBL1585197 0.87
Cyclohexane SCHEMBL5250154 0.85 TP53 (0.57)
Diethylamine SCHEMBL29152597 0.82
Diethylamine SCHEMBL27866596 0.82
Diethylamine SCHEMBL27864415 0.82
Diethylamine SCHEMBL27874841 0.82
Diethylamine SCHEMBL7130457 0.82 TP53 (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102775600-A Polymerization manufacturing technique and device for polyamide WUHAN SENDA TECHNOLOGY RES DEV CT 2012-11-14 CN claimed
US-20090253816-A1 COMPOSITION FOR PREPARING A BIODEGRADABLE POLYURETHANE- BASED FOAM AND A BIODEGRADABLE POLYURETHANE FOAM PHB INDUSTRIAL S.A. (BR) 2009-10-08 US claimed
JP-2009527595-A 2009-07-30 JP claimed
US-20090043000-A1 COMPOSITION FOR PREPARING A DEGRADABLE POLYOL POLYESTER, PROCESS FOR OBTAINING A POLYOL POLYESTER, AN ELASTOMER, FOAMS, PAINTS AND ADHESIVES, AND A DEGRADABLE POLYOL POLYESTER FOAM PHB INDUSTRIAL S.A. (BR) 2009-02-12 US claimed
EP-1987102-A1 COMPOSITION FOR PREPARING A BIODEGRADABLE POLYURETHANE- BASED FOAM AND A BIODEGRADABLE POLYURETHANE FOAM PHB Industrial S.A. (BR) 2008-11-05 EP claimed
EP-1987075-A1 COMPOSITION FOR PREPARING A DEGRADABLE POLYOL POLYESTER, PROCESS FOR OBTAINING A POLYOL POLYESTER, AN ELASTOMER, FOAMS, PAINTS AND ADHESIVES, AND A DEGRADABLE POLYOL POLYESTER FOAM PHB Industrial S.A. (BR) 2008-11-05 EP claimed
WO-2007095710-A1 COMPOSITION FOR PREPARING A DEGRADABLE POLYOL POLYESTER, PROCESS FOR OBTAINING A POLYOL POLYESTER, AN ELASTOMER, FOAMS, PAINTS AND ADHESIVES, AND A DEGRADABLE POLYOL POLYESTER FOAM PHB INDUSTRIAL S.A. (BR) 2007-08-30 WO claimed
WO-2007095713-A1 COMPOSITION FOR PREPARING A BIODEGRADABLE POLYURETHANE- BASED FOAM AND A BIODEGRADABLE POLYURETHANE FOAM PHB INDUSTRIAL S.A. (BR) 2007-08-30 WO claimed
CN-109642972-A Composition, film, near infrared ray cut-off filter, pattern forming method, laminated body, solid-state imager, image display device, camera model and infrared sensor 富士胶片株式会社 2019-04-16 CN disclosed
CN-106367828-A Preparation method of badminton netting lines 安徽翰文运动用品股份有限公司 2017-02-01 CN disclosed
CN-105950095-A Environment-friendly solar cell packaging material 广西南宁智翠科技咨询有限公司 2016-09-21 CN disclosed
CN-102775600-A Polymerization manufacturing technique and device for polyamide WUHAN SENDA TECHNOLOGY RES DEV CT 2012-11-14 CN disclosed
US-20090253816-A1 COMPOSITION FOR PREPARING A BIODEGRADABLE POLYURETHANE- BASED FOAM AND A BIODEGRADABLE POLYURETHANE FOAM PHB INDUSTRIAL S.A. (BR) 2009-10-08 US disclosed
CN-100537147-C Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad TOYO BOSEKI (JP) 2009-09-09 CN disclosed
WO-2007095713-A1 COMPOSITION FOR PREPARING A BIODEGRADABLE POLYURETHANE- BASED FOAM AND A BIODEGRADABLE POLYURETHANE FOAM PHB INDUSTRIAL S.A. (BR) 2007-08-30 WO disclosed
CN-1224499-C Polishing pad, method for producing same, and cushion layer for polishing pad TOYO BOSEKI (JP) 2005-10-26 CN disclosed
CN-1669739-A Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad TOYO BOSEKI (JP) 2005-09-21 CN disclosed
CN-1651192-A Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad TOYO TIRE & RUBBER CO (JP) 2005-08-10 CN disclosed
CN-1651193-A Polishing pad, method for producing same, and cushion layer for polishing pad TOYO TIRE & RUBBER CO (JP) 2005-08-10 CN disclosed
CN-1476367-A Polishing pad, method for producing same, and cushion layer for polishing pad �����֯��ʽ���� 2004-02-18 CN disclosed