SCHEMBL4088243

SCHEMBL4088243

CCCCCC(C)C(C)(C)C

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.48
CA1 P00915 2/20 0.39
SPHK1 Q9NYA1 1/20 0.39
LMNA P02545 1/20 0.39
TP53 P04637 1/20 0.38
DNM1 Q05193 2/20 0.38
TSHR P16473 1/20 0.37
THRB P10828 1/20 0.37
ADH1B P00325 1/20 0.37
ADH1C P00326 1/20 0.37
ADH1A P07327 1/20 0.37
ADH4 P08319 1/20 0.37
ADH7 P40394 1/20 0.37
CA2 P00918 1/20 0.37
FDPS P14324 1/20 0.36
ACE2 Q9BYF1 1/20 0.35
GPR84 Q9NQS5 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6254156 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL10587140 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL7719660 0.97 OPRM1 (0.46) OPRM1CA1SPHK1LMNATP53
SCHEMBL6700324 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL6408263 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL23803921 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL615029 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL6060338 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL8066854 0.97 OPRM1 (0.46) OPRM1SPHK1LMNADNM1TSHR
SCHEMBL6360656 0.97 OPRM1 (0.46) OPRM1CA1SPHK1LMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230377958-A1 CLUSTER PROCESSING SYSTEM FOR FORMING A METAL CONTAINING MATERIAL APPLIED MATERIALS, INC. 2023-11-23 US claimed
US-11756828-B2 Cluster processing system for forming a transition metal material APPLIED MATERIALS, INC. (US) 2023-09-12 US claimed
CN-115399467-A Prune flavor type extract essence, preparation method thereof and application of prune flavor type extract essence in baking stuffing 可菲生物科技有限公司 2022-11-29 CN claimed
CN-100373543-C Rhodium-riched oxygen barriers MICRON TECHNOLOGY INC (US) 2008-03-05 CN claimed
CN-101009217-A Manufacturing method of capacitor SAMSUNG ELECTRONICS CO LTD (KR) 2007-08-01 CN claimed
CN-1292479-C Capacitor for semiconductor device, method for manufacturing the same, and electronic device using the same SAMSUNG ELECTRONICS CO LTD (KR) 2006-12-27 CN claimed
US-7064070-B2 Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process TOKYO ELECTRON LIMITED (JP) 2006-06-20 US claimed
CN-1217860-C Method for appts for mfg oxide Nm srystal PATENT TREUHAND GES FUER ELEKTRISCHE GLUEHLAMPEN MBH (DE) 2005-09-07 CN claimed
WO-2004085491-A2 REMOVAL OF CMP AND POST-CMP RESIDUE FROM SEMICONDUCTORS USING SUPERCRITICAL CARBON DIOXIDE PROCESS TOKYO ELECTRON LIMITED (US) 2004-10-07 WO claimed
CN-1518758-A Rhodium-riched oxygen barriers 2004-08-04 CN claimed
US-20040142564-A1 Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process TOKYO ELECTRON LIMITED (JP) 2004-07-22 US claimed
CN-1441496-A Capacitor for semiconductor device, method for manufacturing the same, and electronic device using the same SAMSUNG ELECTRONICS CO LTD (KR) 2003-09-10 CN claimed
CN-1283591-A Method for appts for mfg oxide Nm srystal PATENT TREUHAND GES FUER ELEKTRISCHE GLUEHLAMPEN MBH (DE) 2001-02-14 CN claimed
WO-2025226900-A1 FLUX GRADIENT MOLYBDENUM GROWTH PROCESS APPLIED MATERIALS, INC. (US) 2025-10-30 WO disclosed
US-20250336722-A1 FLUX GRADIENT MOLYBDENUM GROWTH PROCESS APPLIED MATERIALS INC (US) 2025-10-30 US disclosed
WO-2025106415-A1 ETHYLENE TRIMERIZATION CATALYST SYSTEMS CONTAINING AROMATIC SOLVENTS CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2025-05-22 WO disclosed
EP-0619833-A1 RARE EARTH METAL COORDINATION COMPOUNDS AS LACTONE POLYMERIZATION CATALYSTS. DU PONT (US) 1994-10-19 EP disclosed
US-5346730-A Process for depositing a copper containing layer I KALI-CHEMIE AG (DE) 1994-09-13 US disclosed
WO-1993013155-A1 RARE EARTH METAL COORDINATION COMPOUNDS AS LACTONE POLYMERIZATION CATALYSTS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-07-08 WO disclosed
US-4214116-A Hydrocarbon isomerization utilizing a hydrocarbon promoter with tantalum pentafluoride and hydrogen halide catalyst STANDARD OIL CO. (INDIANA) (US) 1980-07-22 US disclosed