SCHEMBL4088684

SCHEMBL4088684

Clc1cccc([C](c2cccc(Cl)c2)c2cccc(Cl)c2)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 1/20 0.60
TSHR P16473 1/20 0.52
HTT P42858 2/20 0.48
ERCC5 P28715 1/20 0.48
FEN1 P39748 1/20 0.48
KDM4E B2RXH2 1/20 0.48
GRIN2B Q13224 1/20 0.47
ALDH1A1 P00352 2/20 0.46
KCNK3 O14649 1/20 0.46
KCNK9 Q9NPC2 1/20 0.46
POLB P06746 1/20 0.46
GAA P10253 1/20 0.46
MAPT P10636 1/20 0.46
HPGD P15428 1/20 0.46
KCNMA1 Q12791 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10839681 0.81 PARP1 (0.58) PARP1TSHRHTTERCC5FEN1
SCHEMBL2486695 0.80 PARP1 (0.63) PARP1HTTERCC5FEN1ALDH1A1
SCHEMBL3173817 0.79 PARP1 (0.68) PARP1HTTERCC5FEN1ALDH1A1
SCHEMBL4375606 0.79 PARP1 (0.56) PARP1TSHRHTTERCC5FEN1
SCHEMBL3169530 0.79 PARP1 (0.68) PARP1HTTERCC5FEN1ALDH1A1
SCHEMBL16961806 0.79 PARP1 (0.56) PARP1TSHRHTTERCC5FEN1
SCHEMBL3096979 0.79 PARP1 (0.56) PARP1TSHRHTTERCC5FEN1
SCHEMBL1794480 0.79 PARP1 (0.56) PARP1TSHRHTTERCC5FEN1
SCHEMBL3444927 0.77 PARP1 (0.65) PARP1HTTERCC5FEN1ALDH1A1
SCHEMBL674193 0.77 PARP1 (0.54) PARP1TSHRHTTERCC5FEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2048168-A2 Process for producing catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer Sumitomo Chemical Company, Limited (JP) 2009-04-15 EP disclosed
EP-2048170-A2 Second catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer Sumitomo Chemical Company, Limited (JP) 2009-04-15 EP disclosed
EP-2048167-A2 First catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer Sumitomo Chemical Company, Limited (JP) 2009-04-15 EP disclosed
EP-2048169-A2 Third catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer Sumitomo Chemical Company, Limited (JP) 2009-04-15 EP disclosed
US-6914108-B2 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-07-05 US disclosed
US-6900280-B2 Acid macromonomers and their method of preparation CIBA SPECIALTY CHEMICALS CORP. (US) 2005-05-31 US disclosed
US-20040072978-A1 Compositions of acid macromonomers and their method of preparation CIBA SPECIALTY CHEMICALS CORP. 2004-04-15 US disclosed
EP-1392736-A2 ACID MACROMONOMERS AND THEIR METHOD OF PREPARATION Ciba SC Holding AG (CH) 2004-03-03 EP disclosed
US-20030203810-A1 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2003-10-30 US disclosed
US-6586356-B2 Coordination catalyst SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-07-01 US disclosed
EP-1105368-B1 PHOTOACTIVATABLE BASES CONTAINING NITROGEN CIBA SC HOLDING AG (CH) 2002-10-30 EP disclosed
WO-2002079271-A2 ACID MACROMONOMERS AND THEIR METHOD OF PREPARATION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-10-10 WO disclosed
US-20010020075-A1 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-09-06 US disclosed
EP-1112288-A1 THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT Ciba SC Holding AG (CH) 2001-07-04 EP disclosed
EP-1113026-A2 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-04 EP disclosed
EP-1105368-A1 PHOTOACTIVATABLE BASES CONTAINING NITROGEN Ciba SC Holding AG (CH) 2001-06-13 EP disclosed
WO-2000010964-A1 PHOTOACTIVATABLE BASES CONTAINING NITROGEN CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-03-02 WO disclosed
WO-2000011041-A1 THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-03-02 WO disclosed
EP-0703498-B1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEM CORP (JP) 1997-12-29 EP disclosed
EP-0703498-A1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEMICAL CORPORATION (JP) 1996-03-27 EP disclosed