SCHEMBL409056

SCHEMBL409056

C=C(C)C(=O)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL2479707 0.80
Acetone SCHEMBL8678561 0.78
Methacrylic Acid SCHEMBL28196061 0.77 TDP1 (0.44)
Methacrylic Acid SCHEMBL17874336 0.77 TDP1 (0.44)
SCHEMBL16821715 0.75
Bicarbonate SCHEMBL26092734 0.75 FFAR3 (0.46)
Acetic Acid SCHEMBL28091912 0.75
SCHEMBL4902220 0.75
Bicarbonate SCHEMBL10180366 0.75
Methacrylic Acid SCHEMBL28083683 0.74 TDP1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1280 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12605926-B2 Binder composition for secondary battery GRST SINGAPORE PTE. LTD. (SG) 2026-04-21 US claimed
EP-4169110-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2026-04-15 EP claimed
EP-4169106-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2026-04-01 EP claimed
EP-4169108-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2025-12-03 EP claimed
US-12431502-B2 Binder composition for secondary battery GRST SINGAPORE PTE. LTD. (SG) 2025-09-30 US claimed
US-12410265-B2 Method for polymer precipitation GRST SINGAPORE PTE. LTD. (SG) 2025-09-09 US claimed
US-12404356-B2 Method for composite delamination GRST SINGAPORE PTE. LTD. (SG) 2025-09-02 US claimed
US-12401040-B2 Binder composition for secondary battery GRST SINGAPORE PTE. LTD. (SG) 2025-08-26 US claimed
US-12358275-B2 Method for composite delamination GRST SINGAPORE PTE. LTD. (SG) 2025-07-15 US claimed
US-12311648-B2 Method for composite delamination GRST SINGAPORE PTE. LTD. (SG) 2025-05-27 US claimed
US-6004735-A FLUORO(METH)ACRYLATE INTERPOLYMER HAVING TWO DIFFERENT SEGMENTS, ONE OF WHICH IS FLUORINATED AND OLEOPHOBIC AND THE OTHER OF WHICH IS HYDRATABLE. EASTMAN KODAK COMPANY (US) 1999-12-21 US claimed
US-5994005-A Stain resistant protective overcoat for imaged photographic elements EASTMAN KODAK COMPANY (US) 1999-11-30 US claimed
EP-0935165-A2 Stain resistant protective overcoat for imaging elements EASTMAN KODAK COMPANY (US) 1999-08-11 EP claimed
EP-0935169-A2 Stain resistant protective overcoat for imaged photographic elements EASTMAN KODAK COMPANY (US) 1999-08-11 EP claimed
EP-0582667-B1 FLUOROACRYLATE MONOMERS AND POLYMERS, PROCESSES FOR PREPARING THE SAME AND THEIR USE MINNESOTA MINING & MFG (US) 1996-06-26 EP claimed
EP-0300661-B1 Reflection-preventive pellicle film and process for preparation thereof MITSUI PETROCHEMICAL IND (JP) 1995-09-13 EP claimed
EP-0315450-B1 PELLICLE MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1993-09-01 EP claimed
US-5059451-A Coating with a cellulose derivative; rotational film-forming; drying; coating film with a solution of polyfluoro(meth)acrylate; high light transmission; good adhesion MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1991-10-22 US claimed
US-4966813-A OF CELLULOSE DERIVATIVE AND A LAYER OF POLYFLUORO(METH) ACRYLATE FORMED ON BOTH SURFACES MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-10-30 US claimed
EP-0300661-A2 Reflection-preventive pellicle film and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1989-01-25 EP claimed