⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4098628 | 0.92 | GAA (0.31) | — | |
| SCHEMBL2806448 | 0.91 | DPP4 (0.30) | — | |
| SCHEMBL4095006 | 0.84 | GRIN2D (0.44) | — | |
| SCHEMBL4098644 | 0.83 | GRIN2D (0.43) | — | |
| SCHEMBL4092131 | 0.81 | — | — | |
| SCHEMBL4085663 | 0.80 | GAA (0.39) | — | |
| SCHEMBL2409512 | 0.80 | MAPT (0.42) | — | |
| SCHEMBL5607828 | 0.79 | GRIN2D (0.34) | — | |
| SCHEMBL1088144 | 0.76 | POLB (0.33) | — | |
| Methacrylic Acid SCHEMBL18187422 | 0.74 | GAA (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20140162190-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| US-8697343-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |