SCHEMBL4085663

SCHEMBL4085663

C=C(CCC12CC3CC(CC(CO)(C3)C1)C2)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.39
POLB P06746 1/20 0.38
ALDH1A1 P00352 7/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
LMNA P02545 1/20 0.37
TSHR P16473 1/20 0.33
HSD17B10 Q99714 1/20 0.33
THRB P10828 1/20 0.33
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4098628 0.87 GAA (0.31) GAAPOLBALDH1A1KMT2AMEN1
SCHEMBL2409512 0.84 MAPT (0.42) GAAPOLBALDH1A1KMT2AMEN1
SCHEMBL2409327 0.83 EPHX2 (0.44) ALDH1A1KMT2AMEN1TSHRHSD17B10
SCHEMBL5935978 0.83 ALDH1A1 (0.52) GAAPOLBALDH1A1KMT2AMEN1
Methacrylic Acid SCHEMBL736153 0.81 GAA (0.46) GAAPOLBALDH1A1KMT2AMEN1
SCHEMBL4091650 0.80
SCHEMBL4098559 0.79 POLB (0.35) GAAPOLBALDH1A1KMT2AMEN1
SCHEMBL4095006 0.79 GRIN2D (0.44) KMT2AMEN1EPHX2
SCHEMBL3680659 0.78 GAA (0.53) GAAPOLBALDH1A1KMT2AMEN1
SCHEMBL2438575 0.77 POLB (0.50) GAAPOLBALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed