Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.62 |
| ▸ | MEN1 | O00255 | 3/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.62 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | NPC1 | O15118 | 4/20 | 0.50 |
| ▸ | RAB9A | P51151 | 4/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.46 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.46 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.46 |
| ▸ | TACR1 | P25103 | 2/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.45 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
| ▸ | KDM1A | O60341 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16341213 | 0.84 | POLB (0.56) | ALDH1A1MEN1KMT2AKDM4ENPC1 | |
| SCHEMBL20495063 | 0.78 | MEN1 (0.59) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL21059269 | 0.78 | KMT2A (0.59) | ALDH1A1MEN1KMT2AKDM4ENPC1 | |
| SCHEMBL4659336 | 0.78 | ALDH1A1 (0.53) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL11779612 | 0.77 | ALDH1A1 (0.87) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL1491519 | 0.77 | ALDH1A1 (0.56) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL1491522 | 0.77 | ALDH1A1 (0.56) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| Carbamic Acid SCHEMBL28193601 | 0.76 | ALDH1A1 (0.88) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL6121074 | 0.76 | NPC1 (0.53) | ALDH1A1MEN1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL27630590 | 0.76 | HDAC3 (0.62) | ALDH1A1KMT2AL3MBTL1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102053493-B | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2014-07-02 | — | — | CN | claimed |
| CN-101907828-B | Radiation-sensitive composition, protective film and inter layer insulating film, and process for forming the same | JSR CORP | 2013-10-16 | — | — | CN | claimed |
| CN-102053493-A | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2011-05-11 | — | — | CN | claimed |
| CN-101907828-A | Radiation-ray sensitive composition, diaphragm, interlayer dielectric and their formation method | JSR CORP | 2010-12-08 | — | — | CN | claimed |
| CN-1249790-C | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2006-04-05 | — | — | CN | claimed |
| CN-118265229-A | Method for manufacturing laminate and semiconductor package | 富士胶片株式会社 | 2024-06-28 | — | — | CN | disclosed |
| CN-118235091-A | Transfer film, laminate having conductor pattern, method for producing laminate having conductor pattern, and method for producing transfer film | 富士胶片株式会社 | 2024-06-21 | — | — | CN | disclosed |
| US-11988963-B2 | Low temperature cure photoimageable dielectric compositions and methods of their use | NAWROCKI DANIEL J (US) | 2024-05-21 | — | — | US | disclosed |
| CN-117940848-A | Transfer film, method for producing transfer film, method for forming pattern, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-115768838-B | Composition, transfer film, method for producing laminate, method for producing circuit wiring, and method for producing electronic device | 富士胶片株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117621587-A | Laminate and method for producing laminate | 富士胶片株式会社 | 2024-03-01 | — | — | CN | disclosed |
| CN-117597398-A | Composition for pattern formation | 日产化学株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-1273869-C | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2006-09-06 | — | — | CN | disclosed |
| CN-1249790-C | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2006-04-05 | — | — | CN | disclosed |
| CN-1245664-C | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| CN-1717628-A | Curable composition, cured product, color filter and liquid crystal display device | MITSUBISHI CHEM CORP (JP) | 2006-01-04 | — | — | CN | disclosed |
| CN-1479769-A | Radiation-sensitive refractive index-changeable composition and refractive index changing method | ������ʱ����ʽ���� | 2004-03-03 | — | — | CN | disclosed |
| CN-1462298-A | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORP (JP) | 2003-12-17 | — | — | CN | disclosed |
| CN-1445315-A | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2003-10-01 | — | — | CN | disclosed |
| CN-1388919-A | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2003-01-01 | — | — | CN | disclosed |